Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (VA)

Applied Materials (AMAT) Centura AP AdvantEdge G5 Poly

Asset ID: 31235

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Applied Materials (AMAT)

Centura AP AdvantEdge G5 Poly

Polysilicon Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 2010

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Manassas, United States

Available date: Currently Available

Tool ModelCentura AP AdvancedEdge G5 
ProcessCentura G5 POLY 
Software VersionAMS 2.6_48 
System Power Rating 208VAC 3-Phase 
Loading Configuration3 Carrier Stage 
 DescriptionChemicals / Gases Used
Chm Position   1Centura G5HBR/CL2/CH2F2/O2/HE/N2/SF6/CF4/AR/FC3283/FC43
Chm Position   2Centura G5HBR/CL2/CH2F2/O2/HE/N2/SF6/CF4/AR/FC3283/FC43
Chm Position   3Centura G5HBR/CL2/CH2F2/O2/HE/N2/SF6/CF4/AR/FC3283/FC43
Chm Position   4Centura Axiom3%H2/O2 /O2/N2
System Configuration  
DescriptionQty 
   
Main AC Rack1 
Secondary AC Rack1 
IPUP1 
WFIB3 
Endpoint stand1 
Monitor stand1 
Side strage Left1 
Side strage Right1 
Main frame1 
DPS G53 
Axiom1 
FI1  


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