Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
PECVD (Chemical Vapor Deposition)
Date of Manufacture: 2004
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
|Tool Model||Producer SE|
|Software Version (include revision #)||B3.7_64|
|System Power Rating||200/208V AC 3-Phase for System|
|Loading Configuration||2 load port|
|Vendor Chm Model||Chemicals / Gases Used (not to use Micron Proprietary names)|
|Chm/Unit Position 1||PE SILANE||SiH4,NH3,He,NF3,N2O,Ar,N2|
|Chm/Unit Position 2||PE SILANE||SiH4,NH3,He,NF3,N2O,Ar,N2|
|MFC/Pressure Unit:||Brooks GF125/UNIT 856|
Defective part: One Ch-A SiH4 Low MFC.
Fab15 confirmed there were no missing parts.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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