Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Tokyo Electron Ltd. (TEL) TELFORMULA ALD High-K

Asset ID: 12279

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Tokyo Electron Ltd. (TEL)

TELFORMULA ALD High-K

Vertical Furnace

Furnaces/Diffusion Systems

Equipment details:

Date of Manufacture: 2013-2

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 2/25/2022

OEM  Tokyo Electoron
Tool Model  TEL Formula 
Process  AlO+ZrO 
Software Version (include revision #) Ver.2.12 R008
System Power Rating  400V 3P-Y 3W for System,
Loading Configuration  5 lots loading
 Tool:TEL_FORMULA_ALDZROX    
 Process Unit:  Model:Remark
 Controller:    
1APC  VYX-0276-CONT 
 MFC/Pressure Unit:    
1MASS FLOW CONTROLLER HORIBA STECZ512MGXC-24W2 
2MASS FLOW CONTROLLER HORIBA STECZ522MGXC-24W2 
3MASS FLOW CONTROLLER HORIBA STECG111AMC-W-1.5-SUC 
4MASS FLOW CONTROLLER HORIBA STECG111AMC-4CR-SUC  
 Drive Mechanisms:    
1Rotation FOUP Storage    
 FOUP Opener:  1 Ports 
 Gas System:    
1Gas Unit (IGS)  N2,HCl,O3,O2,ZyALD,OCTANE,TMA
2BAKING UNIT HORIBA STECLSC-F530-711GS 
3VAPORIZER SYSTEM HORIBA STECTL-2011L-06U 
 Exhuast System:    
1CAPACITANCE MANOMETER MKS631A02TBEH3 
2CAPACITANCE MANOMETER MKS631A13TBEH3 
3CAPACITANCE MANOMETER MKS631A11TBEH3 
4CAPACITANCE MANOMETER MKS631A11TBEH4 
5CYLINDER VALVE CKDVEC-VH8-X0110/VYX-0276-CONT
 *All OEM cable connecting between FAB to SubFab are require to be list out (Include length in mm) 
      
1Tube Material : Quartz    
2Boat Material : Quartz    
3Pressure control : APC Valve    
4Production wafer : 50    
5Process Temp 200~300degC    


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