Macquarie Semiconductor and Technology on behalf of Macquarie (Asia) Pte Ltd. - UMC

Tokyo Electron Ltd. (TEL) TELFORMULA Anneal

Asset ID: 210195

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Tokyo Electron Ltd. (TEL)

TELFORMULA Anneal

Vertical Furnace

Furnaces/Diffusion Systems

Equipment details:

Date of Manufacture: 2004 Feb

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Singapore, Singapore

Available date: Currently Available



General System Info

Equipment ID: CUALLOY-02

Date of Audit: 13/01/2022

Serial Number: P00000315020

Software Version: TELFORMULA-2 Version 1.41 Rev.R008 [F001FF-00000]

System Controller: TEL Waves

Date of Last PM: 2020.5

Is System On-Line?: No

Off-Line Date (if applicable): 2020.5

SECS/GEM: No

OEM Audit Available?: No

Decontamination Report Exists?: No

Can Produce Wafers AS-IS?: No

Any Known Field Modifications?: No

All Cables Present?: No


Platform Type: TELFORMULA


System 

TEL Model Number: TEL FORMULA Rev.0

TEL Process Name: Anneal

Customer Process Name: CUALLOY

Temperature Range: 0~450 C


General Configuration 

Heater Element Model: Low- Temp VCL-40-001L

Process Condition: LP

N2 Load Lock: Yes

Loading Area Light: No

Force Air Cooling System: Yes

Side Maintenance: Yes

O2 Density Control: Yes

N2 Boat Shower Wafer Cooling: Yes

Furnace Temperature Controller: Yes

Boat Rotation: No

Auto Shutter: Yes

CD-ROM Manuals: No


Wafer Handling 

Wafer Type: 300mm-Si SEMI STD-Notch (STD)

Carrier Type: Maker: Asyst Type: G-4

Carrier Stage Capacity: 4

WTU Type: TEL

Qty of Production Wafers: 50

Boat Operation: Single Boat


Gas Panel Configuration

MFC Make: Horiba

Pressure Transducer Make/Model: NAGANO KEIKI ZT15-Z20-17110(-0.1-0.5MPA)

Vaporizer Make/Model: NA

Ozonizer Make/Model: NA



Vacuum System

Vacuum Pump Included: Yes

Make: EDWARDS

Model: IH80

N2 Ballast Pressure Control: No


Low Vacuum Valve: Yes

Trap: No

Main Valve: Yes


Facilities

Electrical Requirements: 400V

User Interface: TEL

Operation Panel: TEL

Indicator Type: TEL

Operation Software Type: TEL Waves

Gas Leak Detector Type: TEL


TEL Process Names: Anneal, TEOS, HTO, Nitride, Poly, Doped Poly, LPRO

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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