Macquarie Semiconductor and Technology on behalf of Macquarie Finance Korea Co., Ltd.

Applied Materials (AMAT) Centura AP AdvantEdge G5 Mesa T2 Poly

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Asset ID: 205334

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Applied Materials (AMAT)

Centura AP AdvantEdge G5 Mesa T2 Poly

Polysilicon Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: Jan 2015

Currently Configured for: 300mm

Current Equipment Status: Available

Location of Equipment: Gyeonggi-do,, Korea, Republic of

Available date: Currently Available

  1. Centura AP Mainframe
  • Qty 3 – DPS Advantage Mesa T2 Conductor Etch Chambers
  • Qty 1 – Axiom HT Strip Chamber
  1. Application
    1. Etch Centura AP 3 D10 and I AXP Application Package
      1. SILICON AXIOM HT CHAMBER
        1. CCM Cover
        2. Ch AC Cover
      2. CUSTOMER FAB OPTIONS
        1. Fast eDiagnostic Sys Interface
        2. Fast Data Gateway 
        3. Hynix Package 
      3. GAS PANEL OPTIONS - CL2 Purifier
      4. MAINFRAME OPTIONS - Corrosioesistant FI and SWLL
      5. FACTORY INTERFACE OPTIONS
        1. Side Storage Pod 
        2. 3 Load Ports 
        3. Interface A Option 
        4. Infopad Pos A or B 
        5. Operator Access Switch 
        6. Front Facing Intake Plenum
        7. Remote Control System Capable
      6. REMOTE OPTIONS - Voltage Sag Monitor 
      7. NON STANDARD REQUEST
        1. SSP, DIFFERENTIAL PRESSURE SENSOR & HARNESS 
        2. AMAT SUPPLY DUAL iPUP-II Edwards iXLI 80, AP 
        3. DUAL 19" MONITOR MOBILE WORK.STATION, W/EYED PC 
        4. CES GAS PANEL 16 STK STEC SST FL TR ETCH CENTURA AP NG 
    2. W Gate Application 
    3. Post Etch Application 



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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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