Macquarie Semiconductor and Technology on behalf of Macquarie Semiconductor and Technology Inc.
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PECVD (Chemical Vapor Deposition)
Date of Manufacture: 2005
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: San Jose, United States
Available date: TBD
CVD 15-3AMAT_PRODSE3_ACA AMAT PRODUCER SE3 ACA
Missing or damaged parts: Fab15 confirmed there were no missing or damaged parts.
[Chamber A]
Chamber Type:APF
Gas Config(sccm)=MFC Full Scale
C3H6(3000)/O2(15000)/AR(5000)/HE(5000)
RF HF 13.56MHz, max 3kW
[Chamber B]
Chamber Type:APF
Gas Config(sccm)=MFC Full Scale
C3H6(3000)/O2(15000)/AR(5000)/HE(5000)
RF HF 13.56MHz, max 3kW
[Chamber C]
Chamber Type:APF
Gas Config(sccm)=MFC Full Scale
C3H6(3000)/O2(15000)/AR(5000)/HE(5000)
RF HF 13.56MHz, max 3kW
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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