Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)
Multi Block (Resist Coater/Developer)
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
PHOTO 15-3TEL_LI_CT_01 TEL LITHIUS CT
Tool has been de-installed and is stored in an off-site warehouse. No photos provided. Please inspect to collect photos.
Missing or damaged parts: Fab15 confirmed there were no missing or damaged parts.
BLOCK DIAGRAM AVAILABLE: PLEASE ASK YOUR SALES PERSON.
It is a dual-block tool.
[Track Config 1]
Coat cup:3
Developper cup:7
[Track Config 2]
Resist Reduction:RRC
Dev Nozzle: SH（2-4/2-5）
NLD+LD（3-1～3-5）
Resist pump:RDS 10ml
FIRM NOZZLE：FIRM MIXING（3-1～3-5）
[Oven Config]
COT:CPHP x6
[Track Chemicals]
Resist supply:Gallon bottle
Thinner:NONE
DIW
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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