Macquarie Equipment Trading on behalf of Micron Memory Taiwan Co., Ltd. (F16)

Applied Materials Centura AP iSprint

Asset ID: 16072

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Applied Materials

Centura AP iSprint

Metal CVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture:

Currently Configured for: To be determined

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taichung City, Taiwan

Available date: Currently Available

Tool config is based on original PO, please verify tool details at tool inspection


Mainframe Type: Centura AP

Process Applications: W

Chamber Qty 4

Process: WCVD


Number of Load Ports: 3  

Carrier ID Reader (E99):Yes  

WIP Delivery Type: OHT  

Dual FI Robots: No

Atmospheric Robot Type: YASKAWA 

Light Curtain: Yes  

In-Situ Metrology Unit: Yes  


Turbo Throttle Valve (TTV) Drive: Direct

Dual Independent Helium Control: 10/10 TORR (std)

Plasma Detect: Yes  

Clean Method: Astron RPS 


Chamber Roughing Pumps

Manufacturer: Kashiyama

Model: SDE1203 BL


Mainframe and Load Lock Pump

Manufacturer: ALCATEL V3.6 A100L IPUP

Model: V3.6 A100L IPUP


Heat Exchanger

Manufacturer: SMC

Model: INR-012D

Qty: 2


Gas Delivery

Gas Line Input: Bottom Feed


Gas Box Configuration

Chamber Argon MFC: 10000 sccm

Chamber Argon MFC: 10000 sccm

Chamber Argon MFC: 6000 sccm

Chamber Argon MFC: 3000 sccm

Chamber NF3 MFC: 2000 sccm

Chamber WF6 MFC: 500 sccm

Chamber WF6 MFC: 100 sccm

Chamber SiH4 MFC: 200 sccm

Chamber H2 MFC: 8000 sccm

Chamber H2 MFC: 3000 sccm


Damage/Missing parts list

Please inspect tool to reconfirm

Dry pumps and customer provided items not included on sales


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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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