Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

LAM Research 2300 Exelan Flex 45

Asset ID: 205112

Print spec sheet

LAM Research

2300 Exelan Flex 45

Dielectric Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 2007

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 4/1/2022

Tool is operating in clean room.


A HARD DISK DRIVE WILL BE REMOVED FROM TOOL.


[Chamber A]

Chamber type:Flex 45

Gas config.(sccm)=MFC full scale

C4F8(50)/CF4(200)/O2(3000)/Ar(1000)/

CO(500)/CH3F(100)/O2(30)/CHF3(100)/

O2(300)/C4F6(50)/Xe(500)/CH2F2(100)/

N2(1000)

Source 60MHz 2000W/27MHz 3000W/2MHz 5000W

Lid Temp Control ~140℃

ESC Temp Control ~60℃


[Chamber B]

Chamber type:Flex 45

Gas config.(sccm)=MFC full scale

C4F8(50)/CF4(200)/O2(3000)/Ar(1000)/

CO(500)/CH3F(100)/O2(30)/CHF3(100)/

O2(300)/C4F6(50)/Xe(500)/CH2F2(100)/

N2(1000)

Source 60MHz 2000W/27MHz 3000W/2MHz 5000W

Lid Temp Control ~140℃

ESC Temp Control ~60℃


[Chamber C]

Chamber type:Flex 45

Gas config.(sccm)=MFC full scale

C4F8(50)/CF4(200)/O2(3000)/Ar(1000)/

CO(500)/CH3F(100)/O2(30)/CHF3(100)/

O2(300)/C4F6(50)/Xe(500)/CH2F2(100)/

N2(1000)

Source 60MHz 2000W/27MHz 3000W/2MHz 5000W

Lid Temp Control ~140℃

ESC Temp Control ~60℃


Please see photos.

Missing/Broken parts not reported.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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