Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
Date of Manufacture: 2003
Currently Configured for: To be determined
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
Tool has been de-installed and is shipped from Fab15 to an off-site warehouse on April 13, 2022.
Fab15 confirmed there are no missing or damaged parts.
A Nova tool or a DIW Booster unit is not included in tool for sale if it is on configuration or in a picture.
Fab15's shipping kits remain installed on a Cleaner unit of de-installed tool in an off-site warehouse. The shipping kits need to return to Fab15.
| Process | Oxide | |
| Software Version | rp3T6.5_36AMJ1 | |
| System Power Rating | 200V 3-phase for system | |
| Loading Configuration | 3 loadport | |
| Vendor Chm Model | Chemicals / Gases Used | |
| Chm/Unit Position 1 | ___Platen1 - Line1____________________ | _____D4505____________________________ |
| Chm/Unit Position 2 | ___Platen2 - Line1____________________ | _____D4505_____________________________ |
| Chm/Unit Position 3 | ___Platen3 - Line1____________________ | _____D4505_____________________________ |
| Chm/Unit Position 4 | ___Brush 1-1____________________ | _____NH4OH_____________________________ |
| Chm/Unit Position ___ | ___Brush 2-1____________________ | _____FPM_____________________________ |
| Description | Qty | |
| FI UNIT | 1 | |
| CLEANER MODULE | 1 | |
| POLISHER MODULE | 1 | |
| Tool config as below | ||
| Item | Type | AMRFK2ZD00 |
| Tool Type | Reflexion Reflexion-LK Reflexion-LK Prime | Reflexion |
| Polisher | Exchanger Input/Output Stage | 水圧検知式 + デバイス面スプレー有 |
| Head wash kit | Yes | |
| Gap wash kit | None | |
| Pedestal | 3点支点形状 | |
| Wash Tower | None | |
| MKS / SMC | SMC | |
| 3Zone/5Zone/Metal | 3 Zone | |
| Ring Type | SUS + PPS | |
| Speed controller | 無し | |
| Wafer loss sensor | ダークパッド対応 | |
| Head Assy | 標準 DDF3 | |
| Disk clean cup | 無し （横と下から保湿スプレー） | |
| Torque Monitor kit | None | |
| FULL VISION | None | |
| RTPC | None | |
| Reflexion Normal Type | ||
| Normal or High Flow | Normal | |
| Platen1 - Line1 | D4505 | |
| Platen1 - Line2 | Not using | |
| Platen1 - Line3 | None | |
| Platen1 - Line4 | None | |
| Platen2 - Line1 | D4505 | |
| Platen2 - Line2 | Not using | |
| Platen2 - Line3 | None | |
| Platen2 - Line4 | None | |
| Platen3 - Line1 | D4505 | |
| Platen3 - Line2 | Not using | |
| Platen3 - Line3 | None | |
| Platen3 - Line4 | None | |
| Platen4 - Line1 | None | |
| Platen4 - Line2 | None | |
| Platen4 - Line3 | None | |
| Platen4 - Line4 | None | |
| Tubing Pomp Flow Controller | Tubing Pomp | |
| Maker | Toyoko kagaku | |
| Chem Type | D4505 | |
| Pomp Type | Diagram Pomp | |
| Modifed Filter Line | ||
| Maker | ||
| Chem Type | - | |
| Pomp Type | ||
| Maker | ||
| Chem Type | - | |
| Pomp Type | ||
| Maker | ||
| Chem Type | - | |
| Pomp Type | ||
| Maker | ||
| Chem Type | - | |
| Pomp Type | ||
| None | ||
| None | ||
| Clenaer | Pass thru Station Design | |
| 1Piece | ||
| Roller | 0040-87416 (Amat Original) | |
| Spray DIW | 1040-01183 (90-1000cc) | |
| Wafer rotation | 3 Roller + 1 Idler | |
| Brush drive | Belt Drive | |
| Brush gap adjustment | スペーサブロック | |
| Brush opening adjustment | Air cylinder + Hard Stop | |
| Meｇ-1 | - | |
| Meｇ-2 | - | |
| Brush 1（Chem) | Pressurized (75ml Full) | |
| Brush 1-1 | NH4OH | |
| Brush 1-2 | - | |
| Brush 2-1 | FPM | |
| Brush 2-2 | - | |
| Brush1 Chem | 1040-01195 (FutureStar 5-75cc) | |
| Brush1 Spray DIW | 1040-01196 (FutureStar 1-4L) | |
| Brush1 Brush Inner Rinse | 1040-01196 (FutureStar 1-4L) | |
| Brush2 Chem | 1040-01196 (FutureStar 1-4L) | |
| Brush2 Spray DIW | 1040-01196 (FutureStar 1-4L) | |
| Brush2 Brush Inner Rinse | 1040-01196 (FutureStar 1-4L) | |
| Idler | ワッシャー部だけ交換可能 + インナーリング無 | |
| Wafer Roller | Nippou Sangyo | |
| Method | Spindry + Heater | |
| SRD, IPA Vapar | SRD | |
| SRD Sheald | 親水性 | |
| Heater On Detect Hardware | Yes | |
| SRD Front | 1040-01194 (90-1000cc) | |
| SRD Rear | 1040-01194 (90-1000cc) | |
| Robot | FFU | 差圧監視式 （マニュアルモードも可） |
| Maker (Type) | Kawasaki | |
| Wafer Holding mechanism | Plunger | |
| Maker (Type) | kawasaki | |
| Wafer Holding mechanism | Plunger | |
| Walking beam Running beam | Walking Beam | |
| Other | Yes | |
| 3060 / 3090 / i500 / i500+ | Nova i550 | |
| Cognex License ON/OFF | ON | |
| COX-3EN2 | None | |
| Unit /Rev | None | |
| Chemical | - | |
| Reflexion , Reflexion-LK | Yes | |
| Yes | ||
| Yes | ||
| Soft Ver | rp3T6.5_36AMJ1 | |
| cb3.2_45 | ||
| - | ||
| - | ||
| B3.1 | ||
| V4.5R5b43 | ||
| - |
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
Get in touch
Ask about our equipment solutions, ranging from Macquarie equipment inventory sales, sourcing programs, surplus disposition options, and direct equipment purchases.