Macquarie Semiconductor and Technology on behalf of Micron Memory Taiwan Co., Ltd. (F16)

Edwards Atlas Etch


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Asset ID: 209435

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Atlas Etch

Abatement - Scrubber

Support Equipment (Fab)

Equipment details:

Date of Manufacture:

Currently Configured for: N/A

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taichung City, Taiwan

Available date: Currently Available

Excess itemsVendorModelQty
AbatementEDWARDSAtlas TCS MK31
AbatementEDWARDSAtlas TPU MK3B5
AbatementEDWARDSAtlas TPU2S MK21
AbatementEDWARDSHelios4 +s/m3
AbatementEDWARDSLegacy TPU2S + WRU5
AbatementEDWARDSLegacy TPU2S + SM + WESP1

AreaVendorTypeModeloverhaulS/NBonded No.Fixed Asset No.location
FSTEdwardsabatementAtlas TCS mk3done PM106350847DS100073C10203R00313-0A1 4F Cu
FSTEdwardsabatementAtlas TPU mk3Bdone PM146008879DS140031C10203R00365-0A1 4F Cu
FSTEdwardsabatementAtlas TPU mk3Bdone PM136310386DS140030C10203R00364-0A1 4F Cu
FSTEdwardsabatementAtlas TPU mk3Bdone PM136257346DS130337C10203R00362-0A1 4F Hi-K
FSTEdwardsabatementAtlas TPU mk3Bdone PM136257345N/AN/AA1 4F Hi-K
FSTEdwardsabatementAtlas TPU mk3Bdone PM146148981DS1407511209579A2 1F
FSTEdwardsabatementAtlas TPU2S mk2done PM00003294971180C10203R00253-0A1 4F Hi-K
FSTEdwardsabatementHelios4 +S/Mdone PM76207311N/AC10203R00353-0A2 1F
FSTEdwardsabatementHelios4 +S/Mdone PM76111542N/AC10203R00082-0A2 1F
FSTEdwardsabatementHelios4 +S/Mdone PM76185865N/AC10203R00093-0A2 1F
FSTEdwardsabatementLegacy TPU2S + WRUdone PM76207283N/AC10203R00075-0A1 Phase2 1F
FSTEdwardsabatementLegacy TPU2S + WRUdone PM76224731N/AC10203R00108-0A1 Phase2 1F
FSTEdwardsabatementLegacy TPU2S + WRUdone PM76224739N/AC10203R00110-0A1 Phase2 1F
FSTEdwardsabatementLegacy TPU2S + WRUdone PM76227511N/AC10203R00111-0A1 Phase2 1F
FSTEdwardsabatementLegacy TPU2S + WRUdone PM66114465DS130336C10203R00361-0A1 4F Hi-K
FSTEdwardsabatementLegacy TPU2S+SM+WESPdone PM76202874N/AC10203R00112-0A1 Phase1 1F

Atlas™ from Edwards: the range of combustion gas abatement solutions that offers semiconductor, flat panel display, Solar and MOCVD manufacturers reduced operating costs and enhanced ease-of-use. Atlas abatement technology specific to your process:ATLAS™ GAS ABATEMENT SYSTEMS

• Atlas TCS for common CVD gases (NF3/F2)

• Atlas TPU for PFC gases (ClF3, C2F6, C3F8) in CVD processes

• Atlas Kronis for the low-k CVD gases in next-generation processes

• Atlas Etch for semicon etch and flat panel display processes (CF4, SF6 and high flow PFC’s)

• Atlas Helios for safe treatment of hydrogen processes in epitaxy and MOCVD

Features and Benefits

• Low cost of ownership —— Low fuel consumption & Reduced running costs

• Excellent powder handling

• Excellent corrosion resistance

• Outstanding reliability, even on the harshest applications

• Ease of maintenance

• Third party certification —— SEMI® S2, CE marked, ETL listed

• Unrivalled abatement performance for deposition and clean gases

• Flame retardant plastic used in wet stage —— No corrosion from acidic by-products & Lower risk of thermal discharge

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.

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