Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
Dainippon Screen Mfg. Co. (DNS)
Date of Manufacture: AUG 2005
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: 12/25/2022
WET 15-3DNS_SU30_DHF_04R100 DNS SU3000
A Hard Disk Drive will be removed from tool.
Other missing or damaged parts: Not reported.
[Chamber A]
Chemical : AM1(NH4OH/DIW/OTHERS) 70deg
SPRAY : NANO SPRAY N2 5~20L/min
Rinse(front/back) :DIW/ CO2 injection ,resistivity <1MΩ
Spin DRY : N2 100l/min with shield plate, 2500rpm
[Chamber B]
Chemical : DHF(1:300) 23deg,
SPRAY : NANO SPRAY N2 5~20L/min
Rinse(front/back) :DIW/ CO2 injection ,resistivity <1MΩ
Spin DRY : N2 100l/min with shield plate, 2500rpm
[Chamber C]
Chemical : AM1(NH4OH/DIW/OTHERS) 70deg
SPRAY : NANO SPRAY N2 5~20L/min
Rinse(front/back) :DIW/ CO2 injection ,resistivity <1MΩ
Spin DRY : N2 100l/min with shield plate, 2500rpm
[Chamber D]
Chemical : DHF(1:300) 23deg,
SPRAY : NANO SPRAY N2 5~20L/min
Rinse(front/back) :DIW/ CO2 injection ,resistivity <1MΩ
Spin DRY : N2 100l/min with shield plate, 2500rpm
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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