Macquarie Semiconductor and Technology on behalf of Micron Memory Taiwan Co., Ltd. (F16)

Applied Materials (AMAT) Centura AP AdvantEdge G5 Poly

Asset ID: 18121

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Applied Materials (AMAT)

Centura AP AdvantEdge G5 Poly

Polysilicon Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: TBD

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taichung City, Taiwan

Available date: Currently Available

Tool is in service in a clean room.
PROCESS: POLY
Chamber: A,B,C,D
System: EGA132
Project: 417457
MES: ACAPL25200
Platform: Centura AP
SW Version: B3.1_66

Server Type
FE: 306M
FI : 306M
RT: 7326

Chamber Type
VHP: Standard
A: D7 (G5)
B: D7 (G5)
C: D7 (G5)
D: Axiom
A: 400M
B: 400M
C: 400M
D: 400M

 
Tool Damage/Missing Parts: 
Please inspect tool to reconfirm

 

Product images

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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