Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Applied Materials (AMAT) Centura AP AdvantEdge G5 Metal


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Asset ID: 209788

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Applied Materials (AMAT)

Centura AP AdvantEdge G5 Metal

Metal Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: October 2010

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Software Version (include revision #) AMS 2.8_82

System Power Rating 208VAC 3-Phase

Loading Configuration 2 Carrier Stage

Vendor Chm Model     Chemicals / Gases Used

Chm/Unit Position  1  Centura G5 BCL3/CL2/O2/N2/SF6/CHF3/CF4/AR/FC3283/FC43

Chm/Unit Position  2  Centura G5 BCL3/CL2/O2/N2/SF6/CHF3/CF4/AR/FC3283/FC43

Chm/Unit Position  3  Centura Asp CF4/O2/N2

Chm/Unit Position  4  Centura Asp CF4/O2/N2

Main AC Rack

Secondary AC Rack



Endpoint stand

Monitor stand

Side strage Left

Side strage Right

Main frame




Missing parts:

DescriptionMissing (Qty)Defective (Qty)Cannibalized (Qty)
SINGLE RING CERAMIC .50 HEIGHT 300MM HTD ESC300200-04877 expendable Single ring

Please inspect to confirm any other missing or damaged parts.

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.

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