Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Applied Materials (AMAT) Reflexion - Dielectric

Asset ID: 209916

Print spec sheet

Applied Materials (AMAT)

Reflexion - Dielectric

Dielectric CMP

CMP Equipment

Equipment details:

Date of Manufacture: 2003

Currently Configured for: To be determined

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Tool has been de-installed and is shipped from Fab15 to an off-site warehouse on April 13, 2022.

Fab15 confirmed there are no missing or damaged parts.

A Nova tool or a DIW Booster unit is not included in tool for sale if it is on configuration or in a picture.

Fab15's shipping kits remain installed on a Cleaner unit of de-installed tool in an off-site warehouse. The shipping kits need to return to Fab15.


ProcessOxide 
Software Versionrp3T6.5_36AMJ1 
System Power Rating200V 3-phase for system 
Loading Configuration3 loadport 
 Vendor Chm ModelChemicals / Gases Used
Chm/Unit Position   1___Platen1 - Line1_________________________D4505____________________________
Chm/Unit Position   2___Platen2 - Line1_________________________D4505_____________________________
Chm/Unit Position   3___Platen3 - Line1_________________________D4505_____________________________
Chm/Unit Position   4___Brush 1-1_________________________NH4OH_____________________________
Chm/Unit Position ______Brush 2-1_________________________FPM_____________________________
Description Qty
FI UNIT 1
CLEANER MODULE 1
POLISHER MODULE 1
Tool config as below  
   
ItemTypeAMRFK2ZD00
Tool TypeReflexion
Reflexion-LK
Reflexion-LK Prime
Reflexion
PolisherExchanger
Input/Output Stage
水圧検知式
+
デバイス面スプレー有
Head wash kitYes
Gap wash kitNone
Pedestal3点支点形状
Wash TowerNone
MKS / SMCSMC
3Zone/5Zone/Metal3 Zone
Ring TypeSUS + PPS
Speed controller無し
Wafer loss sensorダークパッド対応
Head Assy標準
DDF3
Disk clean cup無し
(横と下から保湿スプレー)
Torque Monitor kitNone
FULL VISIONNone
RTPCNone
 Reflexion Normal Type
Normal or High FlowNormal
Platen1 - Line1D4505
Platen1 - Line2Not using
Platen1 - Line3None
Platen1 - Line4None
Platen2 - Line1D4505
Platen2 - Line2Not using
Platen2 - Line3None
Platen2 - Line4None
Platen3 - Line1D4505
Platen3 - Line2Not using
Platen3 - Line3None
Platen3 - Line4None
Platen4 - Line1None
Platen4 - Line2None
Platen4 - Line3None
Platen4 - Line4None
Tubing Pomp
Flow Controller
Tubing Pomp
 
MakerToyoko kagaku
Chem TypeD4505
Pomp TypeDiagram Pomp
Modifed Filter Line 
Maker 
Chem Type-
Pomp Type 
Maker 
Chem Type-
Pomp Type 
Maker 
Chem Type-
Pomp Type 
Maker 
Chem Type-
Pomp Type 
 None
 None
ClenaerPass thru Station
Design
 
1Piece
Roller0040-87416
(Amat Original)
Spray DIW1040-01183
(90-1000cc)
Wafer rotation3 Roller + 1 Idler
Brush driveBelt Drive
Brush gap adjustmentスペーサブロック
Brush opening adjustmentAir cylinder + Hard Stop
Meg-1-
Meg-2-
Brush 1(Chem)Pressurized (75ml Full)
Brush 1-1NH4OH
Brush 1-2-
Brush 2-1FPM
Brush 2-2-
Brush1 Chem1040-01195
(FutureStar 5-75cc)
Brush1 Spray DIW1040-01196
(FutureStar 1-4L)
Brush1 Brush Inner Rinse1040-01196
(FutureStar 1-4L)
Brush2 Chem1040-01196
(FutureStar 1-4L)
Brush2 Spray DIW1040-01196
(FutureStar 1-4L)
Brush2 Brush Inner Rinse1040-01196
(FutureStar 1-4L)
Idlerワッシャー部だけ交換可能
+
インナーリング無
Wafer RollerNippou Sangyo
MethodSpindry + Heater
SRD, IPA VaparSRD
SRD Sheald親水性
Heater On Detect
Hardware 
Yes
SRD Front1040-01194
(90-1000cc)
SRD Rear1040-01194
(90-1000cc)
RobotFFU差圧監視式
(マニュアルモードも可)
 
Maker (Type)Kawasaki
Wafer Holding mechanismPlunger
Maker (Type)kawasaki
Wafer Holding mechanismPlunger
Walking beam
Running beam
Walking Beam
 
Other Yes
3060 / 3090 / i500 / i500+Nova i550
Cognex License ON/OFFON
COX-3EN2None
Unit /RevNone
Chemical-
Reflexion ,
Reflexion-LK
Yes
Yes
Yes
 
Soft Ver rp3T6.5_36AMJ1
 cb3.2_45
 -
 -
 B3.1
 V4.5R5b43
 -


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