Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Tokyo Electron Ltd. (TEL) NT333

Asset ID: 13487

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Tokyo Electron Ltd. (TEL)

NT333

ALD (Atomic Layer Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: June 2015

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 3/10/2023

Tool is located in clean room and is in HOT IDLE.

Equipment Type: NT333

PM2
Chamber Material:Quartz
Production wafes:5
Process Gas:
??O3(OP-500H / Toshiba Mitsubishi)
??TMA(Baking / AS103-B1 / Hitachi Materials)
??3DMAS(Baking / AS103-A / Hitachi Materials)
??ZyALD(Ampoule / ADEKA)?????
MFC Maker:HITACHI-Metals
Process Temp:270-300deg
TMP Maker:Kashiyama
TMP Model:MU-100X
LLMP Maker:Kashiyama
LLMP Model:MU-180X
Pressure Control:APC Valve

PM3
Chamber Material:Quartz
Production wafes:5
Process Gas:
??O3(OP-500H / Toshiba Mitsubishi)
??TMA(Baking / AS103-B1 / Hitachi Materials)
??3DMAS(Baking / AS103-A / Hitachi Materials)
??ZyALD(Ampoule / ADEKA)?????
MFC Maker:HITACHI-Metals
Process Temp:270-300deg
TMP Maker:Kashiyama
TMP Model:MU-100X
LLMP Maker:Kashiyama
LLMP Model:MU-180X
Pressure Control:APC Valve

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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