Macquarie Semiconductor and Technology on behalf of Micron Memory Taiwan Co., Ltd. (F16)

Edwards Atlas Etch

Asset ID: 209435

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Edwards

Atlas Etch

Abatement - Scrubber

Support Equipment (Fab)

Equipment details:

Date of Manufacture:

Currently Configured for: N/A

Current Equipment Status: Available

Location of Equipment: Taichung City, Taiwan

Available date: Currently Available


Excess itemsVendorModelQty
AbatementEDWARDSAtlas TCS MK31
AbatementEDWARDSAtlas TPU MK3B5
AbatementEDWARDSAtlas TPU2S MK21
AbatementEDWARDSHelios4 +s/m3
AbatementEDWARDSLegacy TPU2S + WRU5
AbatementEDWARDSLegacy TPU2S + SM + WESP1


AreaVendorTypeModeloverhaulS/NBonded No.Fixed Asset No.location
FSTEdwardsabatementAtlas TCS mk3done PM106350847DS100073C10203R00313-0A1 4F Cu
FSTEdwardsabatementAtlas TPU mk3Bdone PM146008879DS140031C10203R00365-0A1 4F Cu
FSTEdwardsabatementAtlas TPU mk3Bdone PM136310386DS140030C10203R00364-0A1 4F Cu
FSTEdwardsabatementAtlas TPU mk3Bdone PM136257346DS130337C10203R00362-0A1 4F Hi-K
FSTEdwardsabatementAtlas TPU mk3Bdone PM136257345N/AN/AA1 4F Hi-K
FSTEdwardsabatementAtlas TPU mk3Bdone PM146148981DS1407511209579A2 1F
FSTEdwardsabatementAtlas TPU2S mk2done PM00003294971180C10203R00253-0A1 4F Hi-K
FSTEdwardsabatementHelios4 +S/Mdone PM76207311N/AC10203R00353-0A2 1F
FSTEdwardsabatementHelios4 +S/Mdone PM76111542N/AC10203R00082-0A2 1F
FSTEdwardsabatementHelios4 +S/Mdone PM76185865N/AC10203R00093-0A2 1F
FSTEdwardsabatementLegacy TPU2S + WRUdone PM76207283N/AC10203R00075-0A1 Phase2 1F
FSTEdwardsabatementLegacy TPU2S + WRUdone PM76224731N/AC10203R00108-0A1 Phase2 1F
FSTEdwardsabatementLegacy TPU2S + WRUdone PM76224739N/AC10203R00110-0A1 Phase2 1F
FSTEdwardsabatementLegacy TPU2S + WRUdone PM76227511N/AC10203R00111-0A1 Phase2 1F
FSTEdwardsabatementLegacy TPU2S + WRUdone PM66114465DS130336C10203R00361-0A1 4F Hi-K
FSTEdwardsabatementLegacy TPU2S+SM+WESPdone PM76202874N/AC10203R00112-0A1 Phase1 1F


Atlas™ from Edwards: the range of combustion gas abatement solutions that offers semiconductor, flat panel display, Solar and MOCVD manufacturers reduced operating costs and enhanced ease-of-use. Atlas abatement technology specific to your process:ATLAS™ GAS ABATEMENT SYSTEMS

• Atlas TCS for common CVD gases (NF3/F2)

• Atlas TPU for PFC gases (ClF3, C2F6, C3F8) in CVD processes

• Atlas Kronis for the low-k CVD gases in next-generation processes

• Atlas Etch for semicon etch and flat panel display processes (CF4, SF6 and high flow PFC’s)

• Atlas Helios for safe treatment of hydrogen processes in epitaxy and MOCVD

Features and Benefits

• Low cost of ownership —— Low fuel consumption & Reduced running costs

• Excellent powder handling

• Excellent corrosion resistance

• Outstanding reliability, even on the harshest applications

• Ease of maintenance

• Third party certification —— SEMI® S2, CE marked, ETL listed

• Unrivalled abatement performance for deposition and clean gases

• Flame retardant plastic used in wet stage —— No corrosion from acidic by-products & Lower risk of thermal discharge

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