Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials (AMAT) Endura II Front-End Metallization

Asset ID: 195180

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Applied Materials (AMAT)

Endura II Front-End Metallization

PVD (Physical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: 2005

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Tool has de-installed and is currently located in an off-site warehouse.

DEADLINE FOR TOOL'S REMOVAL: NOVEMBER 15, 2019.



[Chamber 1]

For Co PVD chamber,ALPS

DCPS;OPTIMA DCG-200,ENI,for PVD

PUMP/CRYO,OBIS,HELIX

HT ESC type stage

Ar;100/20sccm


[Chamber 2]

For Co PVD chamber,ALPS

DCPS;OPTIMA DCG-200,ENI,for PVD

PUMP/CRYO,OBIS,HELIX

HT ESC type stage

Ar;100/20sccm


[Chamber D]

For Pre-CLN chamber,PCXT

RFPS;CDX-2000,13.56/2MHz,COMDEL,for BIAS/SLA

PUMP/TMP MAG1300,LEYBOLD.

Ar;200/20sccm


[Chamber E]

For Degas,Plate heater

PUMP/CRYO,HELIX ON-BOARD IS

Ar,press. Controlled


[Chamber F]

For Degas,Plate heater

PUMP/CRYO,HELIX ON-BOARD IS

Ar,press. Controlled



Missing or damaged parts: Not reported.

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