Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (VA)
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Date of Manufacture: 2005
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Manassas, United States
Available date: Currently Available
Currently Configured for 300mm wafer size
MFG Date: 2005
Tool Status: Deinstalled and moved to the warehouse.
Configuration: Audit to verify.
CMP 6-3AMAT_REFL_POLY AMAT REFL POLY
Tool Model Reflexion LK
Software Version lp384.8_52
208v 3 Ø 60Hz
Loading Configuration 3 load ports (TDK)
System Configuration Description:
1 Polisher – 3 platens
2 Polisher – 4 carriers (contour)
3 Polisher – 8 UPAs (G4+)
4 Polisher – P1 slurry controllers: 50-500ml/min (x2)
5 Polisher – P2 slurry controllers: 50-500ml/min (x2)
6 Polisher – P3 slurry controllers: 50-500ml/min (x2)
7 Cleaner – Running Beam
8 Cleaner – Input, Buffer, Megasonics, Brush Box 1, Brush Box 2, Dryer (Desica – Marangoni)
Description Missing (qty)
ASSY, POLISHER DC POWER SUPPLY (AMAT: 0010-63313) 1
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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