Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)
PECVD (Chemical Vapor Deposition)
Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
Seller Ref: AMAT_PRODGT2_FUV
Tool has been de-installed and is stored in an off-site warehouse.
No photos provided. Please inspect to collect photos.
A Hard Disk Drive is not included in tool.
No other missing or damaged parts reported.
[Chamber A]
Chamber Type:Eterna
Gas Config(sccm)=MFC Full Scale
NH3(1000)/TSA(1000)/H2O(1000)/NH3(1000)/Ar(10000)/He(5000)/O2(250)/Ar(5000)/O2(2500)
Remote plasma 400kHz,max 10kW
[Chamber B]
Chamber type:UV Cure
Gas config. (sccm)=MFC full scale
NF3(5000)/Ar(5000)Ar(35000)/Ar(2000)/Ar(10000)/O3(30000)
Remote plasma 400kHz,max 10kW
[Chamber C]
Chamber Type:Eterna
Gas Config(sccm)=MFC Full Scale
NH3(1000)/TSA(1000)/H2O(1000)/NH3(1000)/Ar(10000)/He(5000)/O2(250)/Ar(5000)/O2(2500)
Remote plasma 400kHz,max 10kW
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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