Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)
Date of Manufacture: October 9, 2013
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: 9/23/2022
Tool is operating in clean room.
Pictures will be collected.
[Chamber A]
Process: W
Hard: SFD
Gas(sccm): WF6(150/450), ClF3(1000), Ar(7000), SiH4(200/800), H2(2000/6000), N2(2000), Ar(7000), H2(1000/3000)
[Chamber B]
Process: W
Hard: SFD
Gas(sccm): WF6(150/450), ClF3(1000), Ar(7000), SiH4(200/800), H2(2000/6000), N2(2000), Ar(7000), H2(1000/3000)
[Chamber C]
Process: W
Hard: SFD
Gas(sccm): WF6(150/450), ClF3(1000), Ar(7000), SiH4(200/800), H2(2000/6000), N2(2000), Ar(7000), H2(1000/3000)
Missing or damaged parts: Not reported. Please inspect to confirm.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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