Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials (AMAT) Centura AP Ultima X

Asset ID: 209810

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Applied Materials (AMAT)

Centura AP Ultima X

HDP CVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: 9/2006

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Software Version (include revision #) B4.4_43   
System Power Rating  400-440V AC/208V AC 3-Phase   
Loading Configuration  2 ENHANCED 25 WAFER FOUP (LOADPORT)   
Chm/Unit Position   1  ULTIMA X HDP-CVD ASiH4, O2, NF3, H2, Ar, He, N2 
Chm/Unit Position   2  ULTIMA X HDP-CVD BSiH4, O2, NF3, H2, Ar, He, N2 
Chm/Unit Position   3  ULTIMA X HDP-CVD CSiH4, O2, NF3, H2, Ar, He, N2 
Process Unit:  Model:Remark  
Controller:  X306   
MFC/Pressure Unit:  HITACHI METALS   
Load Port Types  ENHANCED 25 WAFER FOUP     2
WIP Delivery Type  OHT WIP DELIVERY     1
iPUP for transfer and loadlock chambers      1
Local Center Finder     1
Top RF Generator ENI SPECTRUM 11002-00     3
Side RF Generator ENI SPECTRUM 11002-00     3
Bias RF Generator ENI 10513     3
RPS MKS AX7670     3
Turbo Pump SHIMADZU 3150L     3
Gas Panel: Type USG ISEA NF3, ULTIMA X HDP CVD Pallet, Surface mount     3


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