Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Tokyo Electron Ltd. (TEL) Telius SP-305 SCCM

Asset ID: 12333

Print spec sheet

Tokyo Electron Ltd. (TEL)

Telius SP-305 SCCM

Dielectric Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 2007

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Software Version (include revision #)

Ver2.90-Rev009b-VSTD3.30d

 

 

System Power Rating

 

AC200V 3-Phase

 

 

Loading Configuration

 

3Load port

 

 

Vendor Chm Model

Chemicals / Gases Used 

Chm/Unit Position   1

 

Loder Module

 

 

Chm/Unit Position   2

 

Process ship 1

Ar,C4F8,C5F8,Xe,O2,CF4,CHF3,CH2F2,N2,CO,He,C4F6

Chm/Unit Position   3

 

Process ship 2

Ar,C4F8,C5F8,Xe,O2,CF4,CHF3,CH2F2,N2,CO,He,C4F6

Process Unit:SCCM-Oxide

 

Model:

Remark

 

Controller:EC,MC

 

EC
MC

 

 

MFC/Pressure Unit:

 

FCS-DN
FCSWR-DN
627BRETDD2P
627B11TDC2P

 

 

Drive Mechanisms:

 

x-axis: linear motor
y-axis, z-axis, θ: AC servo motor

 

 

FOUP Opener:

 

FOUP 300E-C-EM001

 

 

Gas System:

 

Accumulation type(12line) Fujikin

 

Exhuast System:

 

TMP(FT-3301(MITSUBISHI))
DRY Pump(MU300-063)

 

 

ローダー モジュール(LM

1

 

 

 

プロセス シップ(PS)

2

 

 

 

ガス ボックス(GB)

2

 

 

 

パワー ラック

1

 

 

 

RF電源(Top 60MHz Daihen)

2

 

 

 

RF電源(Btm 2MHz Daihen)

2

 

 

 

チラー (UBRPD5A-2T2 Daikin)

2

 

 

 


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