Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Applied Materials (AMAT) Reflexion - Dielectric

Asset ID: 207374

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Applied Materials (AMAT)

Reflexion - Dielectric

Dielectric CMP

CMP Equipment

Equipment details:

Date of Manufacture: 2006

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 9/23/2022

A Nova tool or a DIW Booster unit is not included in tool if it is on configuration or in a picture.

ProcessBuff 
Software Versionrp3T6.5_36AMJ1 
System Power Rating200V 3-phase for system 
Loading Configuration3 loadport 
 Vendor Chm ModelChemicals / Gases Used
Chm/Unit Position   1___Platen1 - Line1_________________________D9228_____________________________
Chm/Unit Position   2___Platen1 - Line2_________________________N/A_______________________________
Chm/Unit Position   3___Platen1 - Line3_________________________D9228_____________________________
Chm/Unit Position   4___Platen1 - Line4_________________________N/A_______________________________
Chm/Unit Position   5___Platen2 - Line1_________________________D9228_____________________________
Chm/Unit Position   6___Platen2 - Line2_________________________N/A_______________________________
Chm/Unit Position   7___Platen2 - Line3_________________________D9228_____________________________
Chm/Unit Position   8___Platen2 - Line4_________________________N/A_______________________________
Chm/Unit Position   9___Platen3 - Line1_________________________D9228_____________________________
Chm/Unit Position   10___Platen3 - Line2_________________________N/A_______________________________
Chm/Unit Position   11___Platen3 - Line3_________________________D9228_____________________________
Chm/Unit Position   12___Platen3 - Line4_________________________N/A_______________________________
Chm/Unit Position   13___Brush 1-1_________________________NH4OH_____________________________
Chm/Unit Position   14___Brush 2-1_________________________FPM (HF+H2O2)_____________________________
Description Qty
FI UNIT 1
CLEANER MODULE 1
POLISHER MODULE 1
Tool config as below  
   
ItemTypeAMRFK4KK
(CMP415)
Tool TypeReflexion
Reflexion-LK
Reflexion-LK Prime
Reflexion
PolisherExchanger
Input/Output Stage
(Wafer detection method)
Water pressure detection type
+
surface spray
Head wash kitYes
Gap wash kitYes
PedestalRing shape
Wash TowerYes
MKS / SMCMKS
None
3Zone/5Zone/Metal7 Zone
Ring TypeNormal Type
Wafer loss sensorDark pad correspondence
Head AssyDDF3
Disk clean cupNone
(DIW spray come out from the side and bottom)
Torque Monitor kitYes
FULL VISIONNone
RTPCNone
 Reflexion Normal Type
Normal or High FlowNormal
Platen1 - Line1D9228
Platen1 - Line2Not using
Platen1 - Line3D9228
Platen1 - Line4Not using
Platen2 - Line1D9228
Platen2 - Line2Not using
Platen2 - Line3D9228
Platen2 - Line4Not using
Platen3 - Line1D9228
Platen3 - Line2Not using
Platen3 - Line3D9228
Platen3 - Line4Not using
Platen4 - Line1None
Platen4 - Line2None
Platen4 - Line3None
Platen4 - Line4None
Tubing Pomp
Flow Controller
Flow Controller
(Asahiyukizai)
 None
 None
ClenaerPass thru Station
Design
1Piece
Roller0040-87416
(Amat Original)
Spray DIW1040-01183
(90-1000cc)
Wafer rotate3 Roller + 1 Idler
Brush rotateBelt Drive
Brush gap adjustmentSpacer block
Brush opening adjustmentAir cylinder + Hard Stop
Meg-1-
Meg-2-
Brush 1 composition(Chem)Pressurized (75ml Full)
Brush 1-1NH4OH
Brush 1-2-
Brush 2-1FPM
Brush 2-2-
Brush1 Chem1040-01195
(FutureStar 5-75cc)
Brush1 Spray DIW1040-00191
(TOKYO KEISO 0.4-4L)
Brush1 Brush Inner Rinse1040-00191
(TOKYO KEISO 0.4-4L)
Brush2 Chem1040-00191
(TOKYO KEISO 0.4-4L)
Brush2 Spray DIW1040-00191
(TOKYO KEISO 0.4-4L)
Brush2 Brush Inner Rinse1040-00191
(TOKYO KEISO 0.4-4L)
Idler"Only the washer part can be replaced
+
No inner ring "
Wafer RollerNippou Sangyo
MethodSpindry + Heater
SRD, IPA VaparSRD
SRD ShealdHydrophilic type
Heater On Detect
Hardware 
Yes
SRD Front1040-01194
(90-1000cc)
SRD Rear1040-01194
(90-1000cc)
RobotFFUDifferential pressure adjust type (manual mode possible)
Maker (Type)Kawasaki
Wafer Holding mechanismPlunger
Maker (Type)kawasaki
Wafer Holding mechanismPlunger
Walking beam
Running beam
Walking Beam
Other Yes
3060 / 3090 / i500 / i500+NOVA i500
Cognex License ON/OFFON
COX-3EN2None
Unit /RevNone
Chemical-
Reflexion ,
Reflexion-LK
None
None
None
Soft Ver rp3T6.5_36AMJ1
 cb3.2_45
 IB21e9
 -
 B3.1
 4.4.R3-PA3b3
 6.2


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