Macquarie Semiconductor and Technology on behalf of Inspire Technologies, Inc.
Broadband Patterned Wafer Defect Inspection
Date of Manufacture: March 1991
Currently Configured for: 200mm
Current Equipment Status: Available
Location of Equipment: Caldwell, United States
Available date: Currently Available
DOMESTIC SALE: Only offers from US entities will be considered. Seller will not clear the equipment for export or act as Exporter of Record from the United States.
Estek WIS 850 (WIS 850) - Detection 0.17 um on Silicon at 95% capture rate. Verified by NIST Standards. 2 to 8 inch capable with proper setup. Dark and light channel system. Dark channel is used for detecting particles and any light scattering defects. Light channel is useful for detecting non-light scattering defects such as mounds, dimples and non uniformity. Detects specular flaws, including large particles, mounds, dimples, saw marks, grooves, fractures, slip, epi-spikes, small particles on large grained surfaces, particles buried in/under a film.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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