Macquarie Semiconductor and Technology on behalf of Macquarie Finance Korea Co., Ltd.
Metal CVD (Chemical Vapor Deposition)
Date of Manufacture: Mar 2014
Currently Configured for: 300mm
Current Equipment Status: Available
Location of Equipment: Gyeonggi-do,, Korea, Republic of
Available date: Currently Available
1. Main System
1-1. TRIAS e+ Platform
- Load Port*3 (12" wafer)
- Loader Module
- Lord Lock Module with Cooling*3
- Power Distribution Unit
- Trias Software
- PF S2-0200 Safety
1-2. Ti Process Module(2 Sets)
- PCOT Ti Chamber
- Gas Box
- RF Generation Unit
- Milaebo Trap Interface
- Milaebo Trap Software
1-3. TiN Process Module(2 Sets)
- PCOT TiN Chamber
- Gas Box
- Korea Trap Interface
- Korea Trap Software
2-1. PF Accessory
Load Port
UI Fixing at LM Right Side
EFEM & FAN Check Monitor
TM, LLM Leak Check Port Manual Valve Transfer Navigation System
PF Outer Cable
Edge Grip Blade
LM Fluorescent Light
TM RGA PORT (w/o Manual Valve)
2-2. Ti PM Accessory(2 sets)
Ti Leak Check Port
Ti PM Outer Cable
Ti Gas Box ClF3, H2, NH3 LINE
2-3. TiN PM Accessory(2 sets)
TiN Leak Check Port
TiN High Coverage Process Kit
TiN PM Outer Cable
2-4. Utility Accessory
Utility Interconnection Gas Female
FDC
Signal Tower
CVCF Correspondence
Rear Step
Cable Tray
2-5. Safety
PF, PM S2-0200
Korean & English Safety Label for PF and PM
2-6. Software & AGV
Standard GEM,GJG
On Line
OHT&AGV I/O Monitor Correspondence Omron Carrier ID Reader Correspondence Wafer Log
Wafer ID, PPID, PRJOBID
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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