Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (VA)
ECD (Electro Chemical Deposition)
Date of Manufacture: 9-24-2014
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Manassas, United States
Available date: 9/28/2023
| Software Version | v 1.07b1 | |
| System Power Rating | 208 3 Phase | |
| Loading Configuration | 3 LP | |
| Chamber Description | Chamber Chemicals Gases | |
| Chamber 1 | APT Duet | H2O2 |
| Chamber 4 | Plating Duets | Cu Sulfate |
| Chamber 2 | EBR Duets | Sulfuric Acid and Hydrogen Peroxide |
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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