Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Applied Materials (AMAT) Reflexion - Dielectric

Asset ID: 209906

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Applied Materials (AMAT)

Reflexion - Dielectric

Dielectric CMP

CMP Equipment

Equipment details:

Date of Manufacture: 2006

Currently Configured for: To be determined

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 7/29/2022

A Nova tool or a DIW Booster unit is not included in tool if it is on configuration or in a picture.


ProcessOxide 
Software Versionrp3T6.5_36AMJ1 
System Power Rating200V 3-phase for system 
Loading Configuration3 loadport 
 Vendor Chm ModelChemicals / Gases Used 
Chm/Unit Position   1___Platen1 - Line1_________________________D9228_____________________________
Chm/Unit Position   2___Platen2 - Line1_________________________D9228_____________________________
Chm/Unit Position   3___Platen3 - Line1_________________________CES-333F_____________________________
Chm/Unit Position   4___Brush 1-1_________________________NH4OH_____________________________
Chm/Unit Position ______Brush 2-1_________________________FPM_____________________________
FI UNIT 1
CLEANER MODULE 1
POLISHER MODULE 1
Tool config as below  
   
ItemTypeAMRFK4J400
(CMP208)
Tool TypeReflexion
Reflexion-LK
Reflexion-LK Prime
Reflexion
PolisherExchanger
Input/Output Stage
Water pressure detection type
+
surface spray
Head wash kitYes
Gap wash kitYes
PedestalRing shape
Wash TowerNone
MKS / SMCSMC
None
3Zone/5Zone/Metal3 Zone
Ring TypeAll Peak
Speed controllerNone
Wafer loss sensorDark pad
Head AssyDDF3
Disk clean cupNone
(DIW spray come out from the side and bottom)
Torque Monitor kitYes
FULL VISIONNone
RTPCNone
 Reflexion Normal Type
Normal or High FlowNormal
Platen1 - Line1D9228
Platen1 - Line2Not using
Platen1 - Line3None
Platen1 - Line4None
Platen2 - Line1D9228
Platen2 - Line2Not using
Platen2 - Line3None
Platen2 - Line4None
Platen3 - Line1CES-333F
Platen3 - Line2Not using
Platen3 - Line3None
Platen3 - Line4None
Platen4 - Line1None
Platen4 - Line2None
Platen4 - Line3None
Platen4 - Line4None
Tubing Pomp
Flow Controller
Tubing Pomp
(Only P3 = Flow Controller)
MakerToyoko kagaku
Chem TypeD9228
Pomp TypeDiagram Pomp
Modifed Filter Line 
MakerToyoko kagaku
Chem TypeCES-333F
Pomp TypeDiagram Pomp
Maker 
Chem Type-
Pomp Type 
Maker 
Chem Type-
Pomp Type 
Maker 
Chem Type-
Pomp Type 
 None
 None
ClenaerPass thru Station
Design
1Piece
Roller0040-87416
(Amat Original)
Spray DIW1040-01183
(90-1000cc)
Wafer rotation3 Roller + 1 Idler
Brush driveBelt Drive
Brush gap adjustmentSpacer block
Brush opening adjustmentAir cylinder + Hard Stop
Meg-1-
Meg-2-
Brush 1(Chem)Pressurized (75ml Full)
Brush 1-1NH4OH
Brush 1-2-
Brush 2-1FPM
Brush 2-2-
Brush1 Chem1040-01195
(FutureStar 5-75cc)
Brush1 Spray DIW1040-00191
(TOKYO KEISO 0.4-4L)
Brush1 Brush Inner Rinse1040-00191
(TOKYO KEISO 0.4-4L)
Brush2 Chem1040-00191
(TOKYO KEISO 0.4-4L)
Brush2 Spray DIW1040-00191
(TOKYO KEISO 0.4-4L)
Brush2 Brush Inner Rinse1040-00191
(TOKYO KEISO 0.4-4L)
Idler"Only the washer part can be replaced
+
No inner ring "
Wafer RollerNippou Sangyo
MethodSpindry + Heater
SRD, IPA VaparSRD
SRD ShealdHydrophilic
Heater On Detect
Hardware 
Yes
SRD Front1040-01194
(90-1000cc)
SRD Rear1040-01194
(90-1000cc)
RobotFFUDifferential pressure adjust type (manual mode possible)
Maker (Type)Kawasaki
Wafer Holding mechanismPlunger
Maker (Type)Kawasaki
Wafer Holding mechanismPlunger
Walking beam
Running beam
Walking Beam
Other Yes
3060 / 3090 / i500 / i500+Nova 3060
Cognex License ON/OFFON
COX-3EN2None
Unit /RevNone
Chemical-
Reflexion ,
Reflexion-LK
None
None
None
Soft Ver rp3T6.5_36AMJ1
 cb3.2_45
 IB21e9
 -
 B3.1
 4.4.R3-PA3b3
 -


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