Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)
WCVD (Chemical Vapor Deposition)
Date of Manufacture: 2004
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Taoyuan, Taiwan
Available date: Currently Available
Tool config is based on original PO, please verify tool details at tool inspection
Process: 4200-45 CONTACT W DEP/4200-60 CONTACT W DEP
Software Version: 5.86B150P2
System Power Rating: 208 AC 3-Phase
Loading Configuration: 3load port(Brooks)
Chm Position: 1 C3 ALTUS CHA; Chemicals / Gases Used: Ar/SiH4/H2/WF6/NF3/B2H6
Chm Position: 2 C3 ALTUS CHB; Chemicals / Gases Used: Ar/SiH4/H2/WF6/NF3/B2H6
Damage/Missing parts list
Please inspect tool to reconfirm
Dry pumps and customer provided items not included on sales
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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