Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)
Etch/Ash/Clean - Plasma Processing
Date of Manufacture: 2005
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Taoyuan, Taiwan
Available date: Currently Available
Tool config is based on original PO, please verify tool details at tool inspection
Tool Model: Aspen III HT
Software Version: 5.8B19
System Power Rating: 208AC 3-phase
Loading Configuration: 4 load ports
Chm/Unit Position 1: 2 stage/chamber HT type, PO2/PN2/4%H2N2/CF4
Chm/Unit Position 2: 2 stage/chamber HT type, PO2/PN2/4%H2N2/CF4
Base system- Front
Load port
Mapping- On load port
Front robot
Arm 1- 1 finger
Arm 2- 6 finger
Base system- Load lock
Load /Unload
Slot
Cooling stage- No
Gauge- Convectron
Base system- Transfer Module
Back Robot
Finger- Al2O3
Process system- Chamber 1
Chamber process kits: Quartz (Tube)
Stage material+Max temp.: Al + Al2O3+270 degree
RF gen. model: RFG 3001+13.56 MHz+3000 W
MFC1: AERA D980 / D981-O2-10SLM
MFC2: AERA CF4 -200 SCCM
MFC3: AERA 4% H2N2 5 SLM
MFC4: AERA N2 2 SLM
Gauge: 10 torr MYKROLIS
APC: TGV
Lift pin material: Al2O3
EPD SYSTEM: EPD
Process system- Chamber 2
Chamber process kits: Quartz(tube)
Stage material: Al + Al2O3+270 degree
RF gen. model: RFG 3001+13.56 MHz+3000 W
MFC1: FC-PA789CT-BF-TC-O2-10SLM
MFC2: AERA CF4 -200 SCCM
MFC3: AERA 4% H2N2 5 SLM
MFC4: AERA N2 2 SLM
Gas filter: GLFPF3101VMM4
Gauge: 10 torr MYKROLIS
APC: TGV
Lift pin material: Al2O3
EPD SYSTEM: EPD
Damage/Missing parts list
Please inspect tool to reconfirm
Dry pumps and customer provided items not included on sales
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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