Macquarie Equipment Trading on behalf of Macquarie Asset Finance Japan Limited - US

Tokyo Electron Ltd. CLEAN TRACK LITHIUS i+

Asset ID: 18960

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Tokyo Electron Ltd.

CLEAN TRACK LITHIUS i+

Multi Block (Resist Coater/Developer)

Resist Processing Equipment

Equipment details:

Date of Manufacture: 7/2004

Currently Configured for: 300mm

Current Equipment Status: Available

Location of Equipment: Salt Lake City, United States

Available date: Currently Available

Tool Status:  Deinstalled and moved out of the fab to the warehouse.

Configuration.  Audit to verify.

System Identification  

Description  TEL -- TRACK -- LITHIUS i+ -- 300MM 193NM IMMERSION  

Vendor  TEL  
Model  Lithius-i+
Process  193nm immersion
Interface configured for ASML TWINSCAN XT

 
Received  5/9/2007 9:04:28 AM
In-Service  8/7/2007 12:55:55 PM

Configuration 

HDD removed

Layout - 6 Blocks with 5 FOUP, 2 BCT, 3 COT, 3 ITC and 5 DEV bowls
-  BCT:  2 bowls with 4 lines and 1 EBR dispense capability
-  COT:  3 bowls with 8 lines and 1 EBR dispense capability
-  ITC:  3 bowls with 4 lines
-  DEV:  5 bowls with 1 GP2 nozzle, 1 NLD nozzle and PDR
-  EE:  1 WEE, and 1 BWEE
-  Plates:  11 TRS, 12 HCP, 7 CLHP, 20 CPHP, 4 ADH, 5 CWH and 2 WCPL



Wafer Size - Diameter 300 +/- 0.05mm (SEMI M28), 775 +/- 25um, Notch
Online Connection - GEM / CIM JGJ (Hardware Interface : Ethernet 100Base-Tx)
Sub-Operation Panels - 1 panel on the PRB1, 1 panel on the solvent cabinet
Data Back Up-  ECC = 1 Master, 1 Slave, and 1 Mirror Hard Drive
EMO - Main Track Frame  Track and IFB  4 total
EMO ­External Cabinets - 1 EMO located on front of each cabinet
Cable Length - Total length of cable  20m
Chemical Line Lengths & Type - Total length of chemical lines (flexible stainless steel double containment for all chemical lines. This includes three (3) double containment lines: 1­Solvent, 1­HMDS, 1­Develop):  20m



Data Transfer
-  CD/ROM read write drive
-  3.5mm floppy disk drive
-  USB port located at the main operations panel



External Cabinets
-  Developer cabinet with SPC-124A in subfab
-  Solvent / HMDS cabinet in subfab
-  AC power box in subfab
-  
Cup T&H Controller for 3 Block System - Both T&H in subfab. Shinwa for single cup, Asahi for dual cup


Hardware Configuration - System Overview
-  Block 1, FOUP/Carrier. (300mm with FFU and Semi compliant MENV and FIMS assemblies)
   -  FOUP stations (Comply with SEMI E47.1 (25wafers) - 5 stations)
   -  FOUP ID readers - 5 readers
   -  E84 ­Software and hardware
-  Block 2, Integrated Metrology -
Installation kits (iArcher Kit, Nano Kit, and TEL Kit)
   -  WIS and FFU fan unit for IM block  
   -  Flexible IM block  
   -  SIM bypass module  
   -  TRS (4 Transition Stations)
   -  HCP (2 plates)
   -  CLHP (7 plates)
-  Block 3, BARC (BCT) / Photoresist Coat (COT)
   -  COT units (3 bowls)
   -  Resist lines per coater 8 per bowl
   -  Pump - HPT ­6ml (24 pumps)
   -  PALL .02 Nylon filter (EZD-3) ­PHD11ANME H11B (24 filters)
   -  eBath Nozzle wash per COT (3 – 1 per bowl)
   -  Resist bottle auto switch function
   -  Resist temperature control (3 – 1 per bowl)
   -  Top side EBR nozzles per COT bowl (3 – 1 per bowl)
   -  RRC pre-wet stream nozzle (3 – 1 per bowl)
   -  High resolution cameras/spinner per COT bowl (3 – 1 per bowl)
   -  xxxx

   -  Dispense Timing Control (3 – 1 per bowl)
   -  CWH (3 cup wash holders)
   -  ADH (without COL Arm, located in side tower - 2 units))
   -  High resolution cameras mounted on all spin units
   -  Oven Config (BCT Deck 4)
      - CGHA (5 plates)
      - CADH (3 plates)
-  Block 4, ICT (Top Coat)
   -  Develop unit bowls (6 bowls)
   -  Nozzle per deck: 1 GP Nozl (Dev1), 1 LD Nozl (Dev2)
   -  Dev solution temperature control channels
   -  Top side rinse nozzle 1 per bowl
   -  Surfactant nozzle (1/8" line) 1 per bowl
   -  PDR (N2 & rinse nozzle) 1 per bowl
   -  PCS (3 Pump) system for develop (2 sets)
   -  PCS (2 pump type) system for surfactant
   -  Develop Filters PALL 0.04 Nylon ­PHD44UNDE H23(A)
   -  DIW Filters ­PALL .04 Nylon
      - Rinse -PHD44UNDE H23(A)
      - Back Rinse ­PHD44UNDE H23-2(A)
      - LD Noz clean ­PHD44UNDE H23-2(A)
   -  Surfactant Filters - PALL .04 Nylon ­PHD22UNDE H23(A)
   -  Develop - CPL (2 plates)
   -  Oven Config (DEV Deck 3) - CPHP (8 plates)
-  Block 5, DEV (Develop)
   -  Develop unit bowls (6 bowls)
   -  Nozzle per deck: 1 GP Nozl (Dev1), 1 LD Nozl (Dev2)
   -  Dev solution temperature control channels
   -  Top side rinse nozzle 1 per bowl
   -  Surfactant nozzle (1/8" line) 1 per bowl
   -  PDR (N2 & rinse nozzle) 1 per bowl
   -  PCS (3 Pump) system for develop (2 sets)
   -  PCS (2 pump type) system for surfactant
   -  Develop Filters PALL 0.04 Nylon ­PHD44UNDE H23(A)
   -  DIW Filters ­PALL .04 Nylon
      - Rinse -PHD44UNDE H23(A)
      - Back Rinse ­PHD44UNDE H23-2(A)
      - LD Noz clean ­PHD44UNDE H23-2(A)
   -  Surfactant Filters - PALL .04 Nylon ­PHD22UNDE H23(A)
   -  Develop - CPL (2 plates)
   -  Oven Config (DEV Deck 3) - CPHP (8 plates)
-  Block 6, Stepper Interface
   -  Nanometrics 9010T integrated metrology unit
   -  Lithius Pro Productivity Improvement software
   -  Manuals (2 soft copy and 1 hard copy)

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