Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Tokyo Electron Ltd. (TEL) Expedius+

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Asset ID: 54025

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Tokyo Electron Ltd. (TEL)

Expedius+

Batch Wafer Processing

Etch/Clean - Wet Processing

Equipment details:

Date of Manufacture: 2005-01-01

Currently Configured for: 300mm

Current Equipment Status: Incoming

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available

Process : WNS

Tool config is based on original PO, please verify tool details at tool inspection

OEM: TEL

Tool Model: EXPEDIUS+


Tank:DHF

Guide Material      PCTFE   

Process Bath   Material   PTFE

Temp.      RT

Mixing Ratio (1)      DHF 1:25

Replenishment

Level   Yes

Recipe   No

Pre/Post/Interval   No

Batch Count   5

Feedback   No

Bath Function

Bath Autocover   Yes

Bath Cleaning   Yes

Sampling Line   Yes

Pump      NSPH-55KML

Heater      NES-3123-7

Filter      IHAZ01P01K /0.05um

Conc. Monitor      "CM-210 (for HF 1:25)

0~5% Scaling"

Drain Line

WD1 (HF Waste Water)   Diluted DHF:WD1

WD11   DHF:WD11



Tank:H/C QDR

Guide Material      PCTFE   

Process Bath   Material   QUARTZ

Temp.      RT, 70c

Bath Function

Over Flow Rinse   Yes

Shower(Spray)   Yes

Sampling Line   Yes

Cold DIW (Facility)      40 ~ 60 L/min

Hot DIW (Facility)      40 ~ 60 L/min

Heater      Facility

Drain Line

WD1 (HF Waste Water)   Diluted DHF:WD1

WD3 (UPW Reclaim)   DIW:WD3


Tank: H3PO4-1

Process Bath   Material   QUARTZ

Temp.      157℃

Mixing Ratio (1)      86%

Replenishment

Level   Yes

Recipe   Yes

Feedback   No

Bath Function

Sampling Line   Yes

Pump      NSPH-55G-1

Heater      "NISON KIT

C - Type"

Filter      TGDGATXTH /0.2um*2

Conc. Monitor      KIS-27

Drain Line

WD2 (Neutralization Waste Water Treatment)   Diluted H3PO4:WD2

WD5 (H3PO4)   H3PO4:WD5


Tank: H/C QDR

Process Bath   Material   QUARTZ

Temp.      RT, 70c

Bath Function

Over Flow Rinse   Yes

Shower(Spray)   Yes

Sampling Line   Yes

Cold DIW (Facility)      40 ~ 60 L/min

Hot DIW (Facility)      40 ~ 60 L/min

Heater      Facility

Drain Line

WD2 (Neutralization Waste Water Treatment)   Diluted H3PO4:WD2

WD3 (UPW Reclaim)   DIW:WD3


Tank: H3PO4-2

Process Bath   Material   QUARTZ

Temp.      157℃

Mixing Ratio (1)      86%

Replenishment

Level   Yes

Recipe   Yes

Feedback   No

Bath Function

Sampling Line   Yes

Pump      NSPH-55G-1

Heater      "NISON KIT

C - Type"

Filter      TGDGATXTH /0.2um*2

Conc. Monitor      KIS-27

Drain Line

WD2 (Neutralization Waste Water Treatment)   Diluted H3PO4:WD2

WD5 (H3PO4)   H3PO4:WD5


Tank: H/C QDR

Process Bath   Material   QUARTZ

Temp.      RT, 70c

Bath Function

Over Flow Rinse   Yes

Shower(Spray)   Yes

Sampling Line   Yes

Cold DIW (Facility)      40 ~ 60 L/min

Hot DIW (Facility)      40 ~ 60 L/min

Heater      Facility

Drain Line

WD2 (Neutralization Waste Water Treatment)   Diluted H3PO4:WD2

WD3 (UPW Reclaim)   DIW:WD3


Tank: SC1 (MS)

Guide Material      PTFE

Process Bath   Material   PTFE

Temp.      63℃

Mixing Ratio (1)      "1:4:130, 2:3:100

Circulation type"

Replenishment

Time   360

Level   Yes

Recipe   No

Pre/Post/Interval   No

Batch Count   3

Feedback   Yes

Bath Function

Bath Autocover   Yes

Bath Cleaning   Yes

Megasonic   SSDM 2800W

Sampling Line   Yes

Pump      FF-20BT1

Heater      AIH-124QS-T5

Filter      QCCZATM01K /0.05um

Conc. Monitor      CS-131 (1:4:130, 2:3:100)

Drain Line

WD2 (Neutralization Waste Water Treatment)   "SC1:WD2

Diluted SC1:WD2"



Tank:POU

Guide Material      TEFLON

Process Bath   Material   PTFE(POU)

Temp.      RT, 70c

Mixing Ratio (1)      HCL 1:500, 1:1000

Bath Function

Over Flow Rinse   Yes

Shower(Spray)   Yes

Resistivity Meter   Yes

Sampling Line   Yes

Cold DIW (Facility)      40 ~ 60 L/min

Hot DIW (Facility)      40 ~ 60 L/min

Heater      Facility

Conc. Monitor      CEH-480

Drain Line

WD2 (Neutralization Waste Water Treatment)   "Diluted SC1:WD2

HCL:WD2

Diluted HCL:WD2"

WD3 (UPW Reclaim)   DIW:WD3 (Fab1)

WD32 (Organic Waste Water)   DIW:WD32 (Fab2)


Tank:SD2

Guide Material      TEFLON

Process Bath   Material   PTFE

Temp.      RT

Mixing Ratio (1)      NA

Bath Function

Over Flow Rinse   Yes

Bath Autocover   Yes

N2 Purge   Yes

Resistivity Meter   Yes

Cold DIW (Facility)      40 ~ 60 L/min

Drain Line

WD1 (HF Waste Water)   Yes

WD3 (UPW Reclaim)   DIW:WD3

WD7 (Organic Waste Water)   IPA:WD7


Damage/Missing parts list

Please inspect tool to reconfirm

Dry pumps and customer provided items not included on sales

Product images

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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