Macquarie Equipment Trading on behalf of Micron Memory Japan, G.K. (F15)

Tokyo Electron Ltd. Expedius

Asset ID: 17776

Print spec sheet

Tokyo Electron Ltd.

Expedius

Batch Wafer Processing

Etch/Clean - Wet Processing

Equipment details:

Date of Manufacture: TBC

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Tool has been de-installed and located in an off-site warehouse.

Shipping brackets and kits will need to be supplied by buyer.

No pictures provided: Please inspect to collect photos.

A Hard Disk Drive will be removed from tool.


[Bath 1]

 LAL30(20deg,16.5l/min)

 Bath material :PTFE

 Chuck material :PCTFE

** Only Processing tank is not installed. Purchase of a new processing tank is required to use.


[Bath 2]

 Cold DIW rinse(25deg,40~80l/min)MFB

 Bath material :Quartz


[DRYER1]

 type SD2

 1:200DHF

 IPA/N2 200deg

 100l/min


[DRYER2]

 type SD2

 1:200DHF

 IPA/N2 200deg

 100l/min


Other options:

 Chemilcal filter for acid removal and organic removal


Other missing parts: One Processing tank of BATH 1 unit is missing.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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