Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Tokyo Electron Ltd. (TEL) Telius SP 305 DRM

Asset ID: 209822

Print spec sheet

Tokyo Electron Ltd. (TEL)

Telius SP 305 DRM

Dielectric Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture:

Currently Configured for: To be determined

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

DRY ETCH 15-3TEL_TLUDRM_OX_03AOXEB TEL DRM

Fab15 confirmed there were no missing or damaged parts.


OEM  TEL
Tool Model  TeliusSP-DRM
Process  Oxide
Software Version (include revision #) Ver6.75-Rev000-STD-6.75a
System Power Rating  200 AC 3-Phase
Loading Configuration  4 Loadport
   Vendor Chm ModelChemicals / Gases Used (not to use Micron Proprietary names)
Chm/Unit Position   1  Loder Module  
Chm/Unit Position   2  Process ship 1Ar,C4F8,O2,CF4,CHF3,CH3F,CH2F2,N2,He 
Chm/Unit Position   3  Process ship 2Ar,C4F8,O2,CF4,CHF3,CH3F,CH2F2,N2,He 
Chm/Unit Position   4  Process ship 3Ar,C4F8,O2,CF4,CHF3,CH3F,CH2F2,N2,He 
Description     Qty
Tool:      
Process Unit:  Model:Remark  
Controller:  EC
MC
  1
3
MFC/Pressure Unit:  FCS-DN
FCSWR-DN
627BRETDD2P
627B11TDC2P
  36
3
3
3
Drive Mechanisms:  x-axis: linear motor
y-axis, z-axis, θ: AC servo motor
SINFONIA  1
1
FOUP Opener:  SELOP12F25*  3
Gas System:  Accumulation type(16line) Fujikin  3
Exhuast System:  TMP
DRY Pump
  3
0
Chiller  UBRPD5A-1T  3


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