Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Applied Materials (AMAT) Reflexion LK Copper

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Asset ID: 8213

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Applied Materials (AMAT)

Reflexion LK Copper

Copper CMP

CMP Equipment

Equipment details:

Date of Manufacture: 2006

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available

Process: CUCMP


Tool config is based on original PO, please verify tool details at tool inspection


Base System

Reflexion LK: 4 head, 3 platen polishing system. Dry in Dry out.

Polisher Skins : Dark P1, P2, P3, and P4: 4910 compliant.

Gap Wash: 120 degree nozzles

Load Cup Wafer Exchanger: Enhanced counter balance springs

Nova 3090 Ready: None

Monitor 1 Location : Cart

Monitor 2 Location : Ergo Arm type

Light Tower: Factory Interface and Polisher Sides


Software

LK Software: lp3B4.5_29

Factory Interface : fb4.9_14 Beta

ISRM / RTPC: isB3.0_10

RTPC: B3.0_11


Platen 1

Platen Type : STANDARD (<= 200 RPM)

Endpoint : RTPC

Endpoint: N/A

High Pressure Rinse Flow Meter : 1350-00195 (4.6 l/min)F LOW METER ASSY 1/2OD 1.6-20LPM PFA

Rinse Arms: High Pressure/Flow

Flow Meter : 50-500 ml/min

Temperature Control: P laten Cooling Water


Platen 2

Platen Type : STANDARD (<= 200 RPM)

Endpoint : Full Scan Optical ISRM

Endpoint: N/A

High Pressure Rinse Flow Meter : 1350-00195(4.6 l/min)F LOW METER ASSY 1/2OD 1.6-20LPM PFA

Rinse Arms: High Pressure/Flow

Flow Meter : 50-500 ml/min

Temperature Control: P laten Cooling Water


Platen 3

Platen Type: STANDARD (<= 200 RPM)

Endpoint : Full Scan Optical ISRM

Endpoint: N/A

High Pressure Rinse Flow Meter : 1350-00195(4.6 l/min) F LOW METER ASSY 1/2OD 1.6-20LPM PFA

Rinse Arms: High Pressure/Flow

Flow Meter : 50-500 ml/min

Temperature Contro: l Platen Cooling Water


Polisher

Polisher Technology : SLURRY AND PAD

Polishing Head: CONTOUR GEN III (0.5 TO 5.0 PSI)

Cross Break: N/A

Pad Wafer Loss Sensor: DARK PAD SENSOR

InterPlaten Clean : No

ISRM Laser Key Switch: Y es

Slurry Delivery System : 4 x 12 CLC SDS

Head 1 Power Cable : 0150-16277 CABLE ASSY, HR1, DRIVER-MOTOR POWER, REF

Head 2 Power Cable : 0150-16278 CABLE ASSY, HR2, DRIVER-MOTOR POWER, REF

Head 3 Power Cable : 0150-16279 CABLE ASSY, HR3, DRIVER-MOTOR POWER, REF

Head 4 Power Cable : 0150-16280 CABLE ASSY, HR4, DRIVER-MOTOR POWER, REF

Head 1 Encoder Cable: 0150-16281C ABLE ASSY, 300MM, HR1, DRIVER-RESOLVER

Head 2 Encoder Cable: 0150-16282C ABLE ASSY, 300MM, HR2, DRIVER-RESOLVER

Head 3 Encoder Cable: 0150-16283C ABLE ASSY, 300MM, HR3, DRIVER-RESOLVER

Head 4 Encoder Cable: 0150-16284C ABLE ASSY, 300MM, HR4, DRIVER-RESOLVER

G4+ UPA : MKS UPA

G4+ UPA : SMC UPA


Cleaner Meg

Chemical 1:C LC 1-250 ml/min

Chemical 2:C LC 1-250 ml/min


Brush Box 1

Chemical 1 : 0-1250ml/min

Chemical 2 : 0-1250ml/min


Brush box 2

Brush LDM Type: TwoChemInLineMixed

Chemical 1 : 0-1250ml/min

Chemical 2 : 0-1250ml/min


Dryer Module

Dryer Type :VAPOR DRYER

Recovery Module: N /A

Output Station Dampner: Cap is Viton


Missing/Damaged Parts List

None report, please inspect tool to reconfirm

Product images

The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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