Macquarie Semiconductor and Technology on behalf of Inspire Technologies, Inc.
Date of Manufacture: 1993
Currently Configured for: N/A
Current Equipment Status: Available
Location of Equipment: Caldwell, United States
Available date: Currently Available
OEM: NISSO ENGINEERING
Q'ty : 3
NISON®1800 Phosphoric Acid Circulation System
Stable uniformity and selectivity ratio in SiN etching process.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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