Macquarie Equipment Trading on behalf of Micron Memory Japan, G.K. (F15)

Kaijo Corporation SFT-300

Asset ID: 205554

Print spec sheet

Kaijo Corporation

SFT-300

Batch Wafer Processing

Etch/Clean - Wet Processing

Equipment details:

Date of Manufacture:

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Tool has been de-installed and is stored in an off-site warehouse.


A HARD DISK DRIVE WILL BE REMOVED FROM TOOL.


[Bath 1]

 SPM(140deg,15l/min,circulation, 

     H2SO4 >70wt%,H2O2 >1.0wt%)

 Chemical spiking: auto concentration feed back

 Bath material :Quartz


[Bath 2]

 Hot DIW rinse (75deg,45l/min)

 Bath material :Quartz

 Megasonic :700kHz,900W


[Bath 3]

 Cold DIW

 Rinse(25deg,45l/min)

 Bath material :Quartz

 Megasonic :700kHz,900W


[Bath 4]

 APM(35-65deg,15l/min,circulation)

 Chemical spiking: auto concentration feed back

 Bath material :Quartz

 Megasonic :950kHz,600W*4


[Bath 5]

 Cold DIW rinse(25deg,45l/min)

 Bath material :Quartz

 Megasonic :700kHz,900W


DRYER

 type: IMD2

 IPA MIST : 50deg

 Carrying N2 : 90deg, 100L/min

 Hot N2 : 200deg,150l/min


Other missing or damaged parts: Not reported.

No pictures provided: Please inspect to collect photos.

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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