Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
Date of Manufacture: AUG 2020
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
PM3 AND PM4 listed in tool's configuration were confirmed they were not required for operations at tool's installation and have not been used since the installation. Any gas were not used in both chambers.
|Software Version (include revision #)||v1.80a04-12|
|System Power Rating||380 AC 3-Phase|
|Loading Configuration||3 Load Port|
|Vendor Chm Model||Chemicals / Gases Used (not to use Micron Proprietary names)|
|Chm/Unit Position 1||1157-259-01||HfCl4|
|Chm/Unit Position 2||1069-556-01||UPW|
|Process Unit:Pulsar Reactor Chamber||Model:AXIS|
|MFC/Pressure Unit:Horiba STEC Z7xx series|
|Drive Mechanisms:CDA, Electricity|
|FOUP Opener:3 ports|
|Exhuast System:EDWARDS Pump(iXH610/iXH1000N)|
Fab15 confirmed there were no missing or damaged parts.
Dry pumps and customer provided items are listed in tool's description but not included in tool for sales.
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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