Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (Boise)
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Date of Manufacture: 2007-10-15
Currently Configured for: N/A
Current Equipment Status: Available
Location of Equipment: Boise, United States
Available date: Currently Available
Audit to verify
============= OEM Feature for reference ===============
Mask blank inspection system that achieve both high sensitivity and high throughput simultaneously
| Wavelength of Inspection light source used for inspection | 532nm |
|---|---|
| Inspection sensitivity | φ50 nm (PSL on quartz substrate, normal mode) |
| Inspection time | 12 minutes per plate (normal mode, Inspection area of 142 mm x 142 mm) |
| Applicable substrate | 6025 |
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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