Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, G.K. (F15)

Applied Materials (AMAT) Producer GT APFe

Asset ID: 209807

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Applied Materials (AMAT)

Producer GT APFe

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture: 1/2011

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Software Version (include revision #) B3.7_64  
System Power Rating  208 AC 3-Phase  
Loading Configuration  3 ENHANCED 25 WAFER FOUP(LOADPORT)  
Chm/Unit Position   1  PE CARBON TWIN AH2,C3H6,NF3,Ar,O2,He,N2
Chm/Unit Position   2  PE CARBON TWIN BH2,C3H6,NF3,Ar,O2,He,N2
Chm/Unit Position   3  PE CARBON TWIN CH2,C3H6,NF3,Ar,O2,He,N2
Load Port Types  ENHANCED 25 WAFER FOUP     
WIP Delivery Type  OHT WIP DELIVERY      
EPX Twin 180L for transfer and loadlock chambers       
Local Center Finder     
RF Generator  APEX 3K2P      
AstronEX     


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