Macquarie Semiconductor and Technology on behalf of Macquarie (Asia) Pte Ltd. - UMC

Tokyo Electron Ltd. (TEL) CLEAN TRACK ACT 12

Asset ID: 210189

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Tokyo Electron Ltd. (TEL)

CLEAN TRACK ACT 12

Single Block (Resist Coater/Developer)

Resist Processing Equipment

Equipment details:

Date of Manufacture: 02/2008

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Singapore, Singapore

Available date: Currently Available



Inspect to confirm configuration and condition.


1. MC Serial Number:   E220506

2. Main Controller type: ACT-12 Main CON

3. Vintage:   14

4. MC Configuration:    2 COT + 2 DEV 

5. Stepper/Scanner interface:   TEL/NIKON     

6. Wafer Direction (RtoL or LtoR):       L to R                               

6. Accessory                                                 

 1) AC Power BOX        YES                                                 

  - AC Power Cable:      3 Phase                                                          

 2) TCU:            YES                    

 3) T & H:         YES                    

   - Model:                                                                  

   - Make:          Shinwa              

  4) Chemical Cabinet (Qty):       COT+DEV                                      

                                                                                                                  

7. COATER Units

   1) Unit

       - Resist Nozzles (Qty):          5

       - Resist Pumps (type):           HPT

       - EBR / RRC / BSR :        EBR + RRC + back rinse             

       - Temp/Humidity Sensor: Yes

       - PR auto exchange system: No

       - Photo resist temperature controller installed: Yes    

       - Motor Flange temperature controller installed: Yes 

       - photo resist drain type:

 

   2) 2-2 Unit

       - Resist Nozzles (Qty):          5

       - Resist Pumps (type):           HPT

       - EBR / RRC / BSR:        EBR + RRC + back rinse

       - Temp/Humidity Sensor:    Yes

       - PR auto exchange system: Yes                      

       - Photo resist temperature controller installed: Yes

       - Motor Flange temperature controller installed: Yes

       - photo resist drain type:     FOC center

 

3) 2-3 Unit

       - Resist Nozzles (Qty):          5

       - Resist Pumps (type):           HPT

       - EBR / RRC / BSR:        EBR + RRC + back rinse

       - Temp/Humidity Sensor:    Yes

       - PR auto exchange system: Yes

       - Photo resist temperature controller installed: Yes

       - Motor Flange temperature controller installed: Yes

       - photo resist drain type:      FOC center

 

4) 2-4 Unit

       - Resist Nozzles (Qty):            5           

       - Resist Pumps (type):           HPT

       - EBR / RRC / BSR:        EBR + RRC + back rinse             

       - Temp/Humidity Sensor:    Yes

       - PR auto exchange system: Yes

       - Photo resist temperature controller installed: Yes

       - Motor Flange temperature controller installed: Yes

       - photo resist drain type:      FOC center

 

8. Develop Units             

   1) 3-1 Unit      

       - Develop Nozzle type:         Spray H nozzle 

       - Develop Nozzle Move type: Left to right

       - Rinse:      Two Top rinse

       - Developer Temp control installed:  Yes

       - Auto damper installed:      Yes

       - Auto dummy rinse installed:           NA        

       - Cup type:  STD DEV cup

 

   2) 3-2 Unit

       - Develop Nozzle type:         Spray H nozzle

       - Develop Nozzle Move type: Left to right

       - Rinse:      Two Top rinse

       - Developer Temp control installed: Yes

       - Auto damper installed:      Yes

       - Auto dummy rinse installed:           NA

       - Cup type: STD DEV cup

 

   3) 3-3 Unit

       - Develop Nozzle type:         Spray H nozzle

       - Develop Nozzle Move type: Left to right

       - Rinse:      Two Top rinse

       - Developer Temp control installed: Yes

       - Auto damper installed: Yes

       - Auto dummy rinse installed: NA

       - Cup type:  STD DEV cup

 

  4) 3-4 Unit

       - Develop Nozzle type:         Spray H nozzle

       - Develop Nozzle Move type: Left to right 

       - Rinse:      Two Top rinse 

       - Developer Temp control installed: Yes        

       - Auto damper installed:      Yes

       - Auto dummy rainse installed: Yes   

       - Cup type: STD DEV cup                                                                                                                   

 

9. All Units Q`ty

    - Coater units (Qty):  4

    - Develop units (Qty): 4

    - CHP units (Qty):     NA

    - LHP units (Qty):     12

    - HHP units (Qty):     2

    - PHP units (Qty):      9

    - CPL units (Qty):      9

    - ADH units (Qty):     3

    - TRS units (Qty):      NA

    - WEE Units (Qty):    1

    - PEB Units (Qty):     5

    - FFB Units (Qty):     NA

    - RDW Units (Qty):   NA

    - IRA Block:              Y

    - CSB:                       Y

    -CWH:                      N

    -CWD:                      N

    -TRS:                        N


Damage/Missing parts:

IRA 4-0 (interface robot arm) and WEE were removed. All COT and DEV were heavily cannibalized e.g. spinner motor, drivers, Arm1/2 parts,..etc have been removed. RDS pumps contaminated by RGB chemical. No CPHP, only few HHP, LHP left. CSB and PRA also cannibalized. T&H present but not in working condition.

Only left with few RDS pumps, LHP and HHP which are complete and maybe serviceable but have been contaminated by RGB chemical and unable to clean. 

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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