Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

Applied Materials (AMAT) Endura II Front-End Metallization

Asset ID: 67404

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Applied Materials (AMAT)

Endura II Front-End Metallization

PVD (Physical Vapor Deposition)

Deposition Equipment

Equipment details:

Date of Manufacture:

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Taoyuan, Taiwan

Available date: Currently Available


Tool config is based on original PO, please verify tool details at tool inspection


Process: 100s 55 BDL

Software Version: CPCI B50140

System Power Rating: 208 AC 3-Phase +480V Noraml

Loading Configuration: 3 load port


Chm Position 1: CIPW; Chemicals/ Gases Used: N2,Ar

Chm Position 2: CIPW; Chemicals/ Gases Used: N2,Ar

Chm Position 4: CIPW; Chemicals/ Gases Used: N2,Ar


Process Type: CIP W

Chamber position: 1,2,4

Shutter option: yes

chamber body part number: 0040-98657

Slit valve seal (bonded or o-ring): Bonded

Slit Valve door part number: 0040-84391

Target vendor: Nikko

Target No.: TAG81

Bakeout/idle power (%): 40

E-Mag Power Supply: na

E-Mag Supply Vendor/Type: na

OEM Part Number: na

DC Power supply(AE-MDX): ENI Optima DCG-200Z

AMAT Part number Slave: 0190-22928

OEM Part Number Slave: na

Generator Size : 10kw

Total DC (12 kwh,24kwh, etc): 10kw

Bias Generator : na

AMAT Part number : na

OEM Part Number: na

Bias Generator Size: na

Bias Generator Frequency: na

Rf coil generator: na

AMAT Part number : na

OEM Part Number: na

DC Coil Power Supply: na

AMAT Part Number: na

OEM Part Number: na

Magnet rotation speed (rpm): 95rpm

Magnet shim thickness: na

Magnet type: CIPW

Magnet part number: 0010-30631

Magnet Serial Number (man. Date): no need

Target to magnet spacing(mm): 0.74mm

adaptor p/n: 0040-80366 Rev3

Kit spacer upper p/n: na

Kit spacer lower p/n: na

upper shield p/n: 0020-91244(one piece)

Treatment (Arc spray/Bead Blast): Arc Spray

Treatment roughness (RA): na

lower shield p/n: 0020-91244(one piece)

Treatment (Arc spray/Bead Blast): Arc Spray

Treatment roughness (RA): na

inner(or mid) shield p/n: na

Treatment (Arc spray/Bead Blast): na

Treatment roughness (RA): na

shield clamp p/n: na

Treatment (Arc spray/Bead Blast): na

Treatment roughness (RA): na

inner(or mid) shield clamp p/n: na

Treatment (Arc spray/Bead Blast): na

Treatment roughness (RA): na

lower shield clamp p/n: na

Treatment (Arc spray/Bead Blast): na

Treatment roughness (RA): na

pedestal cover p/n: na

Treatment (Arc spray/Bead Blast): na

Treatment roughness (RA): na

dep ring p/n: 0200-05896

Treatment (Arc spray/Bead Blast): Arc Spray

Treatment roughness (RA): na

cover ring p/n: 0021-32761

Treatment (Arc spray/Bead Blast): Arc Spray

Treatment roughness (RA): na

insulator bushing p/n: na

Treatment (Arc spray/Bead Blast): na

Treatment roughness (RA): na

Shutter: 0021-26896

Treatment (Arc spray/Bead Blast): Arc Spray

Treatment roughness (RA): na

pedestal type: ESC

pedestal p/n: 0010-27430

heater spacing in mm: 57

heater spacing in steps: -46800

min heater spacing in mm: 31

min heater spacing in steps: -69000

max heater spacing in mm: 57

max heater spacing in steps: -48250

Lift fingers p/n: no concern

Lift hoop p/n: no concern

Cryo restrictor(Y/N): na

Cryo restrictor Part Number: na

Max Cryo regen gas load (L): 800

Cryo gate valve (2/3 pos): na

MFC 1 Gas: N2

MFC 1 Cal Factor: na

MFC 1 Size: 100

MFC 1 Type: na

MFC 1 Part Number: na

MFC 2 Gas: na

MFC 2 Cal Factor: na

MFC 2 Size: na

MFC 2 Type: na

MFC 2 Part Number: na

MFC 3 Gas: Ar

MFC 3 Cal Factor: na

MFC 3 Size: 200

MFC 3 Type: na

MFC 3 Part Number: na

MFC 4 Gas: ArH

MFC 4 Cal Factor: na

MFC 4 Size: 20

MFC 4 Type: na

MFC 4 Part Number: na

Chamber base pressure (T): 0.00000005

Chamber Rate-of-Rise(nTorr/min): 294

Press. and ROR at Startup: no concern

Pressure Rise 1 min: no concern

Pressure Rise 5 min: no concern

Pressure Rise 10 min: no concern

Pressure vs. Gas Flow table: no concern

Process Ar Supply Pressure: 37

Process N2 Supply Pressure: 33

Cryo Regen N2 pressure: 100

Vent Ar pressure: 48

Optional Gas (He): na

O2 (Ch. F): na

H2(Ch. E): na

H2(Ch. C): na

CDA: 87

SLIT VALVE CDA: 88

Cooling Water Flow (GPM): 10.2


Damage/Missing parts list

Please inspect tool to reconfirm

Dry pumps and customer provided items not included on sales

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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