Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

LAM Research 2300e6 KIYO EX

Asset ID: 211056

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LAM Research

2300e6 KIYO EX

Polysilicon Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: 2015

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: 2/2/2024

Missing or damaged parts: Fab15 confirmed there are no missing or damaged parts.

Tool ModelKiyo EX e6
Software Version (include revision #)1.8.4_SP8-HF5
System Power Rating200 AC 3-Phase
Loading Configuration4 load ports

Chamber DescriptionChamber Chemicals Gases Used
Chamber PM1Kiyo EXSiCl4,BCl3,Cl2,HBr,CF4,O2,SF6,He,C4F6,CH2F2,Ar,NF3,N2,SO2
Chamber PM2Kiyo EXSiCl4,BCl3,Cl2,HBr,CF4,O2,SF6,He,C4F6,CH2F2,Ar,NF3,N2,SO2
Chamber PM3Kiyo EXSiCl4,BCl3,Cl2,HBr,CF4,O2,SF6,He,C4F6,CH2F2,Ar,NF3,N2,SO2
Chamber PM4Kiyo EXSiCl4,BCl3,Cl2,HBr,CF4,O2,SF6,He,C4F6,CH2F2,Ar,NF3,N2,SO2
Chamber PM5Kiyo EXSiCl4,BCl3,Cl2,HBr,CF4,O2,SF6,He,C4F6,CH2F2,Ar,NF3,N2,SO2
Chamber PM6NoneNone

Cable DescriptionLength
1AC RACK15000

Optional GasCustom Gas LinesTOR
Gas Line 1SiCL4(125) STEC Z719SiCl4 125
Gas Line 2BCL3(300) STEC Z719BCl3 300
Gas Line 3CL2(300) STEC D219CL2 300
Gas Line 4HBr(500) STEC D219HBr 500
Gas Line 5CF4(300) STEC D219CF4 300
Gas Line 6O2(500) STEC D219O2 500
Gas Line 7SF6(300) STEC D219SF6 300
Gas Line 8He(500) STEC D219He 500
Gas Line 9C4F6(200) STEC D219C4F6 200
Gas Line 10CH2F2 150
Gas Line 11Ar 600
Gas Line 12O2 20
Gas Line 13NF3 600
Gas Line 14N2 250
Gas Line 15SO2 300
Gas Line 16NA
Side He BallastHe 300
Tuning Gas 1C4F6 200

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.

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