Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)
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Metal CVD (Chemical Vapor Deposition)
Date of Manufacture: 2018-08-22
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Taoyuan, Taiwan
Available date: Currently Available
Main Frame only
Please refer to tool photos on configuration details
Mcap #: 1346314
Micron MISTI/LID #: SNTRB7T100
Vendor Tool Serial #: T16359
Tool Current Status: Deinstalled
Any defective or missing parts: No
Any modification/conversion/refrofit was perform to the tool?: No
OEM: TEL
Tool Model: TRIAS e+
Software Version (include revision #): V5.700R1
Chamber Name 1: 2
Chamber Name 2: 3
Chamber Name 3: 4
Chamber 1 Description: EXII TISIN
Chamber 2 Description: EXII TISIN
Chamber 3 Description: EXII TISIN
Chamber 1 Chemicals Gases Used: DCS/TiCl4/NH3/ClF3/DCS/N2
Chamber 2 Chemicals Gases Used: DCS/TiCl4/NH3/ClF3/DCS/N2
Chamber 3 Chemicals Gases Used: DCS/TiCl4/NH3/ClF3/DCS/N2
Not Sold with Tool Description 1: NA
N2 Load Port Exists 1: No
N2 Load Port Exists 2: No
Optional Gas 1: NA
Damage/Missing parts list
Please inspect tool to reconfirm
Dry pumps and customer provided items not included on sales
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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