Macquarie Semiconductor and Technology on behalf of Intel Resale Corporation
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Date of Manufacture:
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Chandler, United States
Available date: Currently Available
• Vendor : AMAT
• Model: Centura Epi 300 (2-chamber)
• Wafer Size: 300mm
• Factory Interface (FI) with 2 N2 loadports accommodating FOUP or Open Cassette Loadports (OCLP)
• FI version 5.3
• Transfer Chamber
o Magnetically coupled, single-blade robot handler using On-the-Fly (OTF) wafer centering and Wafer-on-Blade (WOB) wafer detection
o Pneumatic manifolds
• 2 automatic Batch loadlocks using integrated point-of-use pump (iPUP)
• 2 Process Chambers
o Upper and lower quartz domes
o Upper and lower lamp modules
o Susceptor
o Jet Pack blower cooling system
o Exhaust system
o Low Temp Pyrometer
• Temperature control using optical pyrometers and closed loop PID control system
• Remote frame support structure
o Reduced Pressure NextGen Gas panel has mass flow controllers (MFCs) and control valves
o Leak detectors and safety interlocks
• Reduced pressure systems use a second iPUP for the transfer chamber and a remote high capacity pump for each process chamber
• Mainframe computer—c300NT (runs MS Windows NT)
• Front End PC (FE PC) UI commands and configures c300NT
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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