Macquarie Equipment Trading on behalf of Micron Memory Japan, G.K. (F15)

Tokyo Electron Ltd. Telius 305 DRM

Asset ID: 205126

Print spec sheet

Tokyo Electron Ltd.

Telius 305 DRM

Dielectric Etch

Etch/Ash/Clean - Plasma Processing

Equipment details:

Date of Manufacture: June 10, 2002

Currently Configured for: 300mm

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

A Hard Disk Drive will be removed from tool.​

​Other missing or damaged parts: Not reported.


[Chamber A]

Chamber type:DRM

Gas config. (sccm)=FCS full scale

 1line

 Ar(754)/C4F8(43)/O2(46.8)/O2(1215)

 CF4(336)/CHF3(163)/CH2F2(144)/N2(300)

 CO(500)

RF 13.56MHz, max 5000W

Temp Top +30~+80℃

     Wall +40~+80℃

     ESC -10~+60℃

[Chamber B]

Chamber type:DRM

Gas config. (sccm)=FCS full scale

 1line

 Ar(754)/C4F8(43)/O2(46.8)/O2(1215)

 CF4(336)/CHF3(163)/CH2F2(144)/N2(300)

 CO(500)

RF 13.56MHz, max 5000W

Temp Top +30~+80℃

     Wall +40~+80℃

     ESC -10~+60℃


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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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