Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Applied Materials (AMAT) Reflexion - Dielectric

Asset ID: 209881

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Applied Materials (AMAT)

Reflexion - Dielectric

Dielectric CMP

CMP Equipment

Equipment details:

Date of Manufacture: 2006

Currently Configured for: To be determined

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

Fab15 confirmed there were no missing or damaged parts.

More details of tool's configuration Available. Please contact your sales person for it.

A Nova tool or a DIW Booster unit is not included in tool if it is on configuration or in a picture.

Tool has stopped the operations and is still powered on. Fab15's clean room layout will not allow the tool to be removed from the fab until June 1, 2023.

Tool Model  Reflexion
Process  Buff
Software Version (include revision #) rp3T6.5_36AMJ1
System Power Rating  200V 3-phase for system
Loading Configuration  3 loadport
   Vendor Chm ModelChemicals / Gases Used (not to use Micron Proprietary names)
Chm/Unit Position   1  ___Platen1 - Line1_________________________D4505_____________________________
Chm/Unit Position   2  ___Platen1 - Line2_________________________STI2401____________________________
Chm/Unit Position   3  ___Platen1 - Line3_________________________D9228_____________________________
Chm/Unit Position   4  ___Platen1 - Line4_________________________STI2910____________________________
Chm/Unit Position   5  ___Platen2 - Line1_________________________D4505_____________________________
Chm/Unit Position   6  ___Platen2 - Line2_________________________STI2401____________________________
Chm/Unit Position   7  ___Platen2 - Line3_________________________D9228_____________________________
Chm/Unit Position   8  ___Platen2 - Line4_________________________STI2910____________________________
Chm/Unit Position   9  ___Platen3 - Line1_________________________D4505_____________________________
Chm/Unit Position   10  ___Platen3 - Line2_________________________STI2401____________________________
Chm/Unit Position   11  ___Platen3 - Line3_________________________D9228_____________________________
Chm/Unit Position   12  ___Platen3 - Line4_________________________STI2910____________________________
Chm/Unit Position   13  ___Brush 1-1_________________________NH4OH_____________________________
Chm/Unit Position   14  ___Brush 2-1_________________________FPM (HF+H2O2)_____________________________

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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.

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