Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
Date of Manufacture: 2006
Currently Configured for: To be determined
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
Fab15 confirmed there were no missing or damaged parts.
More details of tool's configuration Available. Please contact your sales person for it.
A Nova tool or a DIW Booster unit is not included in tool if it is on configuration or in a picture.
Tool has stopped the operations and is still powered on. Fab15's clean room layout will not allow the tool to be removed from the fab until June 1, 2023.
| OEM | AMAT | ||
| Tool Model | Reflexion | ||
| Process | Buff | ||
| Software Version (include revision #) | rp3T6.5_36AMJ1 | ||
| System Power Rating | 200V 3-phase for system | ||
| Loading Configuration | 3 loadport | ||
| Vendor Chm Model | Chemicals / Gases Used (not to use Micron Proprietary names) | ||||
| Chm/Unit Position 1 | ___Platen1 - Line1____________________ | _____D4505_____________________________ | |||
| Chm/Unit Position 2 | ___Platen1 - Line2____________________ | _____STI2401____________________________ | |||
| Chm/Unit Position 3 | ___Platen1 - Line3____________________ | _____D9228_____________________________ | |||
| Chm/Unit Position 4 | ___Platen1 - Line4____________________ | _____STI2910____________________________ | |||
| Chm/Unit Position 5 | ___Platen2 - Line1____________________ | _____D4505_____________________________ | |||
| Chm/Unit Position 6 | ___Platen2 - Line2____________________ | _____STI2401____________________________ | |||
| Chm/Unit Position 7 | ___Platen2 - Line3____________________ | _____D9228_____________________________ | |||
| Chm/Unit Position 8 | ___Platen2 - Line4____________________ | _____STI2910____________________________ | |||
| Chm/Unit Position 9 | ___Platen3 - Line1____________________ | _____D4505_____________________________ | |||
| Chm/Unit Position 10 | ___Platen3 - Line2____________________ | _____STI2401____________________________ | |||
| Chm/Unit Position 11 | ___Platen3 - Line3____________________ | _____D9228_____________________________ | |||
| Chm/Unit Position 12 | ___Platen3 - Line4____________________ | _____STI2910____________________________ | |||
| Chm/Unit Position 13 | ___Brush 1-1____________________ | _____NH4OH_____________________________ | |||
| Chm/Unit Position 14 | ___Brush 2-1____________________ | _____FPM (HF+H2O2)_____________________________ | |||
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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