Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)
Date of Manufacture: 2006
Currently Configured for: To be determined
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Hiroshima, Japan
Available date: Currently Available
A Nova tool or a DIW Booster unit is not included in tool if it is on configuration or in a picture.
Tool has stopped the operations and is still powered on. Fab15's clean room layout will not allow the tool to be removed from Fab15 until August 27, 2023.
| Process | Oxide | |
| Software Version | rp3T6.5_36AMJ1 | |
| System Power Rating | 200V 3-phase for system | |
| Loading Configuration | 3 loadport | |
| Vendor Chm Model | Chemicals / Gases Used | |
| Chm/Unit Position 1 | ___Platen1 - Line1____________________ | _____D9228____________________________ |
| Chm/Unit Position 2 | ___Platen2 - Line1____________________ | _____D9228____________________________ |
| Chm/Unit Position 3 | ___Platen3 - Line1____________________ | _____D9228____________________________ |
| Chm/Unit Position 4 | ___Brush 1-1____________________ | _____NH4OH_____________________________ |
| Description | Qty | |
| FI UNIT | 1 | |
| CLEANER MODULE | 1 | |
| POLISHER MODULE | 1 | |
| Tool config as below | ||
| Item | Type | AMLKK4KP00 (CMP416) |
| Tool Type | Reflexion Reflexion-LK Reflexion-LK Prime | Reflexion |
| Polisher | Exchanger Input/Output Stage | 水圧検知式 + デバイス面スプレー有 |
| Head wash kit | Yes | |
| Gap wash kit | Yes | |
| Pedestal | リング形状 | |
| Wash Tower | Yes | |
| MKS / SMC | MKS | |
| None | ||
| 3Zone/5Zone/Metal | 7 Zone | |
| Ring Type | Normal Type | |
| Speed controller | 無し | |
| Wafer loss sensor | ダークパッド対応 | |
| Head Assy | 標準 DDF3 | |
| Disk clean cup | 無し （横と下から保湿スプレー） | |
| Torque Monitor kit | Yes | |
| FULL VISION | None | |
| RTPC | None | |
| Reflexion Normal Type | ||
| Normal or High Flow | Normal | |
| Platen1 - Line1 | D9228 | |
| Platen1 - Line2 | Not using | |
| Platen1 - Line3 | None | |
| Platen1 - Line4 | None | |
| Platen2 - Line1 | D9228 | |
| Platen2 - Line2 | Not using | |
| Platen2 - Line3 | None | |
| Platen2 - Line4 | None | |
| Platen3 - Line1 | D9228 | |
| Platen3 - Line2 | Not using | |
| Platen3 - Line3 | None | |
| Platen3 - Line4 | None | |
| Platen4 - Line1 | None | |
| Platen4 - Line2 | None | |
| Platen4 - Line3 | None | |
| Platen4 - Line4 | None | |
| Tubing Pomp Flow Controller | Flow Controller (Malema) | |
| Maker | Toyoko kagaku | |
| Chem Type | D9228 | |
| Pomp Type | Diagram Pomp | |
| Modifed Filter Line | ||
| Maker | ||
| Chem Type | - | |
| Pomp Type | ||
| Maker | ||
| Chem Type | - | |
| Pomp Type | ||
| Maker | ||
| Chem Type | - | |
| Pomp Type | ||
| Maker | ||
| Chem Type | - | |
| Pomp Type | ||
| None | ||
| Yes | ||
| Clenaer | Pass thru Station Design | 1Piece |
| Roller | 0040-87416 (Amat Original) | |
| Spray DIW | 1040-01183 (90-1000cc) | |
| Wafer rotation | 3 Roller + 1 Idler | |
| Brush drive | Belt Drive | |
| Brush gap adjustment | スペーサブロック | |
| Brush opening adjustment | Air cylinder + Hard Stop | |
| Meｇ-1 | - | |
| Meｇ-2 | - | |
| Brush 1（Chem) | Pressurized (75ml Full) | |
| Brush 1-1 | NH4OH | |
| Brush 1-2 | - | |
| Brush 2-1 | FPM | |
| Brush 2-2 | - | |
| Brush1 Chem | 1040-01195 (FutureStar 5-75cc) | |
| Brush1 Spray DIW | 1040-00191 (東京計装 0.4-4L) | |
| Brush1 Brush Inner Rinse | 1040-00191 (東京計装 0.4-4L) | |
| Brush2 Chem | 1040-00191 (東京計装 0.4-4L) | |
| Brush2 Spray DIW | 1040-00191 (東京計装 0.4-4L) | |
| Brush2 Brush Inner Rinse | 1040-00191 (東京計装 0.4-4L) | |
| Idler | ワッシャー部だけ交換可能 + インナーリング無 | |
| Wafer Roller | Nippou Sangyo | |
| Method | Spindry + Heater | |
| SRD, IPA Vapar | SRD | |
| SRD Sheald | 親水性 | |
| Heater On Detect Hardware | Yes | |
| SRD Front | 1040-01194 (90-1000cc) | |
| SRD Rear | 1040-01194 (90-1000cc) | |
| Robot | FFU | 差圧監視式 （マニュアルモードも可） |
| Maker (Type) | Kawasaki | |
| Wafer Holding mechanism | Plunger | |
| Maker (Type) | kawasaki | |
| Wafer Holding mechanism | Plunger | |
| Walking beam Running beam | Walking Beam | |
| Other | ||
| 3060 / 3090 / i500 / i500+ | Yes | |
| Cognex License ON/OFF | Nova 3060 | |
| COX-3EN2 | ON | |
| Unit /Rev | None | |
| Chemical | None | |
| Reflexion , Reflexion-LK | - | |
| None | ||
| None | ||
| Soft Ver | rp3T6.5_36AMJ1 | |
| cb3.2_45 | ||
| IB21e9 | ||
| - | ||
| B3.1 | ||
| 4.4.R3-PA3b3 | ||
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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