Macquarie Semiconductor and Technology on behalf of Micron Memory Japan, K.K. (F15)

Applied Materials (AMAT) Reflexion - Dielectric

Asset ID: 207375

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Applied Materials (AMAT)

Reflexion - Dielectric

Dielectric CMP

CMP Equipment

Equipment details:

Date of Manufacture: 2006

Currently Configured for: To be determined

Current Equipment Status: Available

Asset HDD not included

Location of Equipment: Hiroshima, Japan

Available date: Currently Available

A Nova tool or a DIW Booster unit is not included in tool if it is on configuration or in a picture.

Tool has stopped the operations and is still powered on. Fab15's clean room layout will not allow the tool to be removed from Fab15 until August 27, 2023.

ProcessOxide 
Software Versionrp3T6.5_36AMJ1 
System Power Rating200V 3-phase for system 
Loading Configuration3 loadport 
 Vendor Chm ModelChemicals / Gases Used
Chm/Unit Position   1___Platen1 - Line1_________________________D9228____________________________
Chm/Unit Position   2___Platen2 - Line1_________________________D9228____________________________
Chm/Unit Position   3___Platen3 - Line1_________________________D9228____________________________
Chm/Unit Position   4___Brush 1-1_________________________NH4OH_____________________________
Description Qty
FI UNIT 1
CLEANER MODULE 1
POLISHER MODULE 1
Tool config as below  
   
ItemTypeAMLKK4KP00
(CMP416)
Tool TypeReflexion
Reflexion-LK
Reflexion-LK Prime
Reflexion
PolisherExchanger
Input/Output Stage
水圧検知式
+
デバイス面スプレー有
Head wash kitYes
Gap wash kitYes
Pedestalリング形状
Wash TowerYes
MKS / SMCMKS
None
3Zone/5Zone/Metal7 Zone
Ring TypeNormal Type
Speed controller無し
Wafer loss sensorダークパッド対応
Head Assy標準
DDF3
Disk clean cup無し
(横と下から保湿スプレー)
Torque Monitor kitYes
FULL VISIONNone
RTPCNone
 Reflexion Normal Type
Normal or High FlowNormal
Platen1 - Line1D9228
Platen1 - Line2Not using
Platen1 - Line3None
Platen1 - Line4None
Platen2 - Line1D9228
Platen2 - Line2Not using
Platen2 - Line3None
Platen2 - Line4None
Platen3 - Line1D9228
Platen3 - Line2Not using
Platen3 - Line3None
Platen3 - Line4None
Platen4 - Line1None
Platen4 - Line2None
Platen4 - Line3None
Platen4 - Line4None
Tubing Pomp
Flow Controller
Flow Controller
(Malema)
MakerToyoko kagaku
Chem TypeD9228
Pomp TypeDiagram Pomp
Modifed Filter Line 
Maker 
Chem Type-
Pomp Type 
Maker 
Chem Type-
Pomp Type 
Maker 
Chem Type-
Pomp Type 
Maker 
Chem Type-
Pomp Type 
 None
 Yes
ClenaerPass thru Station
Design
1Piece
Roller0040-87416
(Amat Original)
Spray DIW1040-01183
(90-1000cc)
Wafer rotation3 Roller + 1 Idler
Brush driveBelt Drive
Brush gap adjustmentスペーサブロック
Brush opening adjustmentAir cylinder + Hard Stop
Meg-1-
Meg-2-
Brush 1(Chem)Pressurized (75ml Full)
Brush 1-1NH4OH
Brush 1-2-
Brush 2-1FPM
Brush 2-2-
Brush1 Chem1040-01195
(FutureStar 5-75cc)
Brush1 Spray DIW1040-00191
(東京計装 0.4-4L)
Brush1 Brush Inner Rinse1040-00191
(東京計装 0.4-4L)
Brush2 Chem1040-00191
(東京計装 0.4-4L)
Brush2 Spray DIW1040-00191
(東京計装 0.4-4L)
Brush2 Brush Inner Rinse1040-00191
(東京計装 0.4-4L)
Idlerワッシャー部だけ交換可能
+
インナーリング無
Wafer RollerNippou Sangyo
MethodSpindry + Heater
SRD, IPA VaparSRD
SRD Sheald親水性
Heater On Detect
Hardware 
Yes
SRD Front1040-01194
(90-1000cc)
SRD Rear1040-01194
(90-1000cc)
RobotFFU差圧監視式
(マニュアルモードも可)
Maker (Type)Kawasaki
Wafer Holding mechanismPlunger
Maker (Type)kawasaki
Wafer Holding mechanismPlunger
Walking beam
Running beam
Walking Beam
Other  
3060 / 3090 / i500 / i500+Yes
Cognex License ON/OFFNova 3060
COX-3EN2ON
Unit /RevNone
ChemicalNone
Reflexion ,
Reflexion-LK
-
None
None
 
Soft Ver rp3T6.5_36AMJ1
 cb3.2_45
 IB21e9
 -
 B3.1
 4.4.R3-PA3b3
  


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The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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