Macquarie Semiconductor and Technology on behalf of Inspire Technologies, Inc.
Date of Manufacture: 1993
Currently Configured for: N/A
Current Equipment Status: Available
Location of Equipment: Caldwell, United States
Available date: Currently Available
OEM: NISSO ENGINEERING
Q'ty : 3
NISON®1800 Phosphoric Acid Circulation System
Stable uniformity and selectivity ratio in SiN etching process.
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