Macquarie Semiconductor and Technology on behalf of Micron Technology, Inc. (Boise)
Date of Manufacture: 2006
Currently Configured for: 300mm
Current Equipment Status: Available
Asset HDD not included
Location of Equipment: Boise, United States
Available date: Currently Available
Tool Status: Powered up.
Configuration. Audit to verify.
I. Base Unit for LPRO MLD Process
Including
(A)Cabinets /Units /Controllers
*Furnace Cabinet (Including Ultra-clean Air Flow System)
*Scavenger and Water Cooling Unit
*Power Supply Unit, (U/P Box)
(Including Control Unit, Transformers, SCR, and Breaker Unit)
*Main Controller (waves)
*Temperature Controller
-
(B)FOUP and Wafer Handling Automation
*FOUP Load Port
*FOUP Transfer
*18 FOUP Stocker
*FIMS Port
*KHI Wafer Load Automation
*Boat Elevator w/Boat Rotation Mechanism
*Variable Pitch Change Mechanism (w/5 fork)
*Auto Tube Shutter
(C)100wfs FTP Heather: VOS-56-101
*Includes Outer/Inner T/C
(D)INtergreated Gas System for LPRO
*O2 gas stick
*H2 gas stick
*N2O gas stick
*NO gas stick
*Purge N2
*Vacuum Vent
*Exhaust Vent
*Piping tape heater
(E)Vacuum foreline configuations
*100A foreline piping
*Foreline heater
*APS Main Valve
*Vacuum Gage & Pressure switch
(F)US Safety (s2-0302, S8-0999)
(G)Quartzware Set for LPRO
(Icluding 100 slots Quartz Boat & All quartz reactor)
II.Per System Options-
(a)N2 Load Lock Option
(Including O2 Analyzer)
(b) Dual Boat Operation
(c)Fixture for Start Up and Maintenance
(d)N2 boat cooling shower
(e) Final Valve unit
(f) WVG Unit
(g)O3 generator unit
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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